Japan
8
2014-06-12
8
2015-02-10
These are the the leading inventors for applications assigned to Tokyo Ohka Kogyo Co., Ltd.:
Tokyo Ohka Kogyo Co., Ltd. based in , JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Sulfonium salt, method for producing the same, and photoacid generator
#2 | 2010-03-04 ✅ Patent 8,720,456 granted on 2014-05-13Processing apparatus fluid-processing a process target body
#3 | 2009-12-31 ✅ Patent 8,167,687 granted on 2012-05-01Method of thinning wafer and support plate
#4 | 2009-05-21 ✅ Patent 7,785,768 granted on 2010-08-31Thermoacid generator for antireflection film formation, composition for antireflection film formation, and antireflection film made therefrom
#5 | 2006-07-11 ✅ Patent 7,074,543 granted on 2006-07-11Positive resist composition and method of forming resist pattern from the same
#6 | 2006-06-13 ✅ Patent 7,060,361 granted on 2006-06-13Silica-based organic film and method of manufacturing the same, and base material comprising organic film
#7 | 2005-10-13 ✅ Patent 7,261,994 granted on 2007-08-28Positive resist composition
#8 | 2005-06-23 ✅ Patent 7,235,500 granted on 2007-06-26Material for forming silica based film
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