Japan
22
2011-02-24
22
2013-01-22
These are the the leading inventors for applications assigned to Hoya Corporation:
Hoya Corporation based in , JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Manufacturing of glass
#2 | 2010-07-22 ✅ Patent 8,398,459 granted on 2013-03-19Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
#3 | 2010-06-29 ✅ Patent 7,745,842 granted on 2010-06-29Graytone mask and method thereof
#4 | 2009-04-30 ✅ Patent 7,690,969 granted on 2010-04-06Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
#5 | 2008-07-22 ✅ Patent 7,402,228 granted on 2008-07-22Manufacturing method and apparatus of phase shift mask blank
#6 | 2008-06-10 ✅ Patent 7,384,870 granted on 2008-06-10Method for manufacturing glass substrate
#7 | 2007-10-25 ✅ Patent 7,420,886 granted on 2008-09-02Magnetic recording medium, and thermal stability measuring method and apparatus of magnetic recording medium
#8 | 2007-10-16 ✅ Patent 7,282,121 granted on 2007-10-16Manufacturing method and apparatus of phase shift mask blank
#9 | 2007-08-28 ✅ Patent 7,261,980 granted on 2007-08-28X-ray mask blank and x-ray mask
#10 | 2007-08-16 ✅ Patent 8,012,314 granted on 2011-09-06Manufacturing method and apparatus of phase shift mask blank
#11 | 2007-05-22 ✅ Patent 7,220,446 granted on 2007-05-22Management technique of friction coefficient based on surface roughness, substrate for information recording medium, information recording medium and manufacture method thereof
#12 | 2007-05-22 ✅ Patent 7,220,500 granted on 2007-05-22Magnetic recording medium, and thermal stability measuring method and apparatus of magnetic recording medium
#13 | 2007-01-02 ✅ Patent 7,155,767 granted on 2007-01-02Scrub cleaning device, scrub cleaning method, and manufacturing method of information recording medium
#14 | 2006-11-23 ✅ Patent 7,355,213 granted on 2008-04-08Electrode material and semiconductor element
#15 | 2006-07-04 ✅ Patent 7,070,481 granted on 2006-07-04Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
#16 | 2006-06-15 ✅ Patent 7,494,401 granted on 2009-02-24Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
#17 | 2006-06-08 ✅ Patent 7,438,630 granted on 2008-10-21Polishing method, polishing device, glass substrate for magnetic recording medium, and magnetic recording medium
#18 | 2005-08-11 ✅ Patent 7,465,523 granted on 2008-12-16Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask
#19 | 2005-03-31 ✅ Patent 7,261,845 granted on 2007-08-28Plastic lens and process for preparing the lens
#20 | 2005-03-01 ✅ Patent 6,861,659 granted on 2005-03-01Method of inspecting ununiformity of transparent material, apparatus therefor, and method of selecting transparent substrate
#21 | 2005-02-15 ✅ Patent 6,855,467 granted on 2005-02-15Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask
#22 | 2005-02-08 ✅ Patent 6,852,003 granted on 2005-02-08Method of manufacturing glass substrate for data recording medium
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