Anelva Corporation

City:

Country:

Japan

Published Applications:

Last publication date:

2005-05-26

Patent Grants:

Last grant date:

2007-12-25

Top Inventors for applications by Anelva Corporation

These are the the leading inventors for applications assigned to Anelva Corporation:

Yoshimi Watabe 2 Tokyo, Japan
Tomoyuki Akashi 2 Tokyo, Japan
Hiroshi Tanabe 2 Tokyo, Japan
Katsuhisa YUDA 1 Tokyo, Japan

Hiroshi Nogami 1 Tokyo, Japan

Recent patent applications by Anelva Corporation

Anelva Corporation based in , JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2005-05-26 ✅ Patent 7,312,418 granted on 2007-12-25

US20050109743A1

Electricity

Semiconductor thin film forming system

#2 | 2005-03-01 ✅ Patent 6,861,614 granted on 2005-03-01

US9612551

S system for the formation of a silicon thin film and a semiconductor-insulating film interface

#3 | 2005-02-08 ✅ Patent 6,851,384 granted on 2005-02-08

US9820149

Remote plasma apparatus for processing substrate with two types of gases

AssigneeID:

401733 ⎘