Materials CMP Holdings, Inc.

City:

Newark, Delaware

Country:

United States

Published Applications:

Last publication date:

2005-08-04

Patent Grants:

Last grant date:

2008-08-19

Top Inventors for applications by Materials CMP Holdings, Inc.

These are the the leading inventors for applications assigned to Materials CMP Holdings, Inc.:

Mary Jo Kulp 1 Newark, DE United States

Recent patent applications by Materials CMP Holdings, Inc.

Materials CMP Holdings, Inc. based in Newark, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2005-08-04 ✅ Patent 7,414,080 granted on 2008-08-19

US20050171225A1

Performing operations; transporting

Polyurethane polishing pad

AssigneeID:

408175 ⎘