South Korea
20
2022-09-08
20
2025-07-29
These are the the leading inventors for applications assigned to Semes Co., Ltd.:
Semes Co., Ltd. based in , KR has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
CLEANING DEVICE AND METHOD OF SUBSTRATE TRANSFER DEVICE
#2 | 2020-11-26 ✅ Patent 12,125,678 granted on 2024-10-22Filter unit, substrate treating apparatus including the same, and substrate treating method
#3 | 2018-08-30 ✅ Patent 10,823,779 granted on 2020-11-03Apparatus and method for manufacturing substrates
#4 | 2016-06-02 ✅ Patent 9,995,787 granted on 2018-06-12Apparatus and method for manufacturing substrates
#5 | 2013-10-31 ✅ Patent 9,529,267 granted on 2016-12-27Method for processing a substrate and apparatus for performing the same
#6 | 2013-10-03 ✅ Patent 9,285,416 granted on 2016-03-15Apparatus and method for manufacturing substrates
#7 | 2011-11-10 ✅ Patent 8,211,269 granted on 2012-07-03Wafer spin chuck and an etcher using the same
#8 | 2010-05-20 ✅ Patent 7,862,765 granted on 2011-01-04Method for synthesizing conductive composite
#9 | 2010-05-20 ✅ Patent 8,631,756 granted on 2014-01-21Apparatus for processing substrate and method of maintaining the apparatus
#10 | 2009-12-10 ✅ Patent 8,287,333 granted on 2012-10-16Single type substrate treating apparatus and method
#11 | 2009-11-12 ✅ Patent 8,253,059 granted on 2012-08-28Apparatus and method of cleaning substrate
#12 | 2009-05-14 ✅ Patent 7,900,853 granted on 2011-03-08Apparatus for supplying chemical liquid
#13 | 2009-04-23 ✅ Patent 8,007,634 granted on 2011-08-30Wafer spin chuck and an etcher using the same
#14 | 2009-04-09 ✅ Patent 7,944,363 granted on 2011-05-17Apparatus and method of sensing leakage of chemical liquid
#15 | 2008-06-26 ✅ Patent 7,618,599 granted on 2009-11-17Reaction chamber for manufacturing a carbon nanotube, apparatus for manufacturing the carbon nanotube and system for manufacturing the carbon nanotube
#16 | 2008-06-05 ✅ Patent 8,038,838 granted on 2011-10-18Spin head, method of operating the spin head and apparatus for treating substrates with the spin head
#17 | 2008-03-06 ✅ Patent 7,802,579 granted on 2010-09-28Apparatus and method for treating substrates
#18 | 2008-01-10 ✅ Patent 8,033,378 granted on 2011-10-11Buffer system for adjusting first-in first-out
#19 | 2007-12-13 ✅ Patent 7,962,989 granted on 2011-06-21Apparatus for cleaning flat panel display and roll brush used therein
#20 | 2006-12-26 ✅ Patent 7,154,611 granted on 2006-12-26Spin etcher with thickness measuring system
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