Japan
11
2019-06-13
11
2020-02-18
These are the the leading inventors for applications assigned to Air Water Inc.:
Air Water Inc. based in , JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method for manufacturing substrate
#2 | 2018-02-22 ✅ Patent 10,186,421 granted on 2019-01-22Composite semiconductor substrate
#3 | 2017-08-17 ✅ Patent 10,186,585 granted on 2019-01-22Semiconductor device and method for manufacturing the same
#4 | 2014-04-17 ✅ Patent 9,453,277 granted on 2016-09-27Method of heat treatment and the directions for use of furnace of heat treatment
#5 | 2014-02-20 ✅ Patent 8,906,786 granted on 2014-12-09Method for producing single crystal SiC substrate and single crystal SiC substrate produced by the same
#6 | 2013-08-22 ✅ Patent 9,562,533 granted on 2017-02-07Cryogenic pump for liquefied gases
#7 | 2013-02-14 ✅ Patent 8,986,448 granted on 2015-03-24Method of manufacturing single crystal 3C-SiC substrate and single crystal 3C-SiC substrate obtained from the manufacturing method
#8 | 2011-06-30 ✅ Patent 8,758,856 granted on 2014-06-24Method of fluoridation and directions for use of a unit of fluoridation
#9 | 2011-04-21 ✅ Patent 8,563,442 granted on 2013-10-22Method for manufacturing nitrogen compound semiconductor substrate and nitrogen compound semiconductor substrate, and method for manufacturing single crystal SiC substrate and single crystal SiC substrate
#10 | 2010-10-07 ✅ Patent 8,603,901 granted on 2013-12-10Method for producing single crystal SiC substrate and single crystal SiC substrate produced by the same
#11 | 2007-08-02 ✅ Patent 7,691,203 granted on 2010-04-06Film forming apparatus
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