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Assignee profile:

Nikon Engineering Co., Ltd.

City:

Yokohama-shi

Country:

Japan

Published Applications:

Last publication date:

2018-08-23

Patent Grants:

Last grant date:

2019-02-12

Top Inventors for applications by Nikon Engineering Co., Ltd.

These are the the leading inventors for applications assigned to Nikon Engineering Co., Ltd.:

Hiroyuki NAGASAKA 19 Kumagaya-shi, Japan
Takeshi OKUYAMA 18 Yokohama-shi, Japan
Hiroyuki Nagasaka 17 Kumagaya, Japan
Takeshi Okuyama 15 Yokohama, Japan

Hirotaka KOHNO 3 Ageo-shi, Japan
Katsushi NAKANO 3 Kumagaya-shi, Japan
Katsushi Nakano 1 Kumagaya, Japan
Hirotaka Kohno 1 Ageo, Japan

Takeshi Okuyama 1 Yokohama-shi, Kanagawa-ken, Japan
Hiroyuki Nagasaka 1 Kumagaya-shi, Saitama-ken, Japan

Recent patent applications by Nikon Engineering Co., Ltd.

Nikon Engineering Co., Ltd. based in Yokohama-shi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2018-08-23

US20180239266A1

Physics

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

#2 | 2018-01-11 ✅ Patent 10,203,614 granted on 2019-02-12

US20180011411A1

Physics

Exposure apparatus, exposure method, and method for producing device

#3 | 2017-11-16

US20170329239A1

Physics

EXPOSURE APPARATUS AND METHOD FOR PRODUCING DEVICE

#4 | 2017-04-06 ✅ Patent 9,778,580 granted on 2017-10-03

US20170097578A1

Physics

Exposure apparatus, exposure method, and method for producing device

#5 | 2017-03-09 ✅ Patent 9,977,352 granted on 2018-05-22

US20170068176A1

Physics

Exposure apparatus and device manufacturing method

#6 | 2016-04-07 ✅ Patent 9,529,273 granted on 2016-12-27

US20160097982A1

Physics

Exposure apparatus, exposure method, and method for producing device

#7 | 2015-11-19 ✅ Patent 9,500,959 granted on 2016-11-22

US20150331335A1

Physics

Exposure apparatus and device manufacturing method

#8 | 2014-10-16 ✅ Patent 9,746,781 granted on 2017-08-29

US20140307238A1

Physics

Exposure apparatus and method for producing device

#9 | 2014-10-09 ✅ Patent 9,097,988 granted on 2015-08-04

US20140300878A1

Physics

Exposure apparatus and device manufacturing method

#10 | 2013-11-07 ✅ Patent 9,134,621 granted on 2015-09-15

US20130293860A1

Physics

Exposure apparatus, exposure method, and method for producing device

#11 | 2012-08-09 ✅ Patent 8,797,505 granted on 2014-08-05

US20120200836A1

Physics

Exposure apparatus and device manufacturing method

#12 | 2010-08-05 ✅ Patent 8,704,999 granted on 2014-04-22

US20100195067A1

Physics

Exposure apparatus, exposure method, and method for producing device

#13 | 2009-06-18 ✅ Patent 8,218,127 granted on 2012-07-10

US20090153820A1

Physics

Exposure apparatus and device manufacturing method

#14 | 2008-10-30 ✅ Patent 8,482,716 granted on 2013-07-09

US20080266533A1

Physics

Exposure apparatus, exposure method, and method for producing device

#15 | 2007-11-15 ✅ Patent 8,508,713 granted on 2013-08-13

US20070263195A1

Physics

Exposure apparatus, exposure method, and method for producing device

#16 | 2007-11-01 ✅ Patent 8,692,973 granted on 2014-04-08

US20070252964A1

Physics

Exposure apparatus and method for producing device

#17 | 2007-09-27 ✅ Patent 8,717,533 granted on 2014-05-06

US20070222957A1

Physics

Exposure apparatus, exposure method, and method for producing device

#18 | 2007-08-23 ✅ Patent 8,373,843 granted on 2013-02-12

US20070195301A1

Physics

Exposure apparatus, exposure method, and method for producing device

#19 | 2007-06-21

US20070139628A1

Physics

Exposure apparatus, exposure method, and method for producing device

#20 | 2006-08-10 ✅ Patent 7,508,490 granted on 2009-03-24

US20060176456A1

Physics

Exposure apparatus and device manufacturing method

Also check out NIKON ENGINEERING CO., LTD.'s (Yokohama-shi, Japan) applicant profile with 3 patent applications submitted.

AssigneeID:

44562 ⎘