Tokyo
Japan
59
2015-12-03
56
2016-11-29
These are the the leading inventors for applications assigned to GIGAPHOTON INC.:
GIGAPHOTON INC. based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
System and method for generating extreme ultraviolet light, and laser apparatus
#2 | 2014-12-18TWO-STAGE LASER SYSTEM FOR ALIGNERS
#3 | 2014-02-20 ✅ Patent 8,902,948 granted on 2014-12-02Polarization purity control device and gas laser apparatus provided with the same
#4 | 2013-12-05 ✅ Patent 8,855,167 granted on 2014-10-07Gas discharge chamber
#5 | 2012-12-20 ✅ Patent 8,399,870 granted on 2013-03-19Extreme ultraviolet light source device and control method for extreme ultraviolet light source device
#6 | 2012-10-04 ✅ Patent 8,592,787 granted on 2013-11-26Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device
#7 | 2012-09-06 ✅ Patent 8,817,839 granted on 2014-08-26Two-stage laser system for aligners
#8 | 2012-07-12 ✅ Patent 8,891,574 granted on 2014-11-18Polarization purity control device and gas laser apparatus provided with the same
#9 | 2012-07-12 ✅ Patent 8,502,178 granted on 2013-08-06Extreme ultraviolet light source apparatus, method for controlling extreme ultraviolet light source apparatus, and recording medium with program recorded thereon
#10 | 2012-05-17EXTREME ULTRAVIOLET LIGHT SOURCE SYSTEM
#11 | 2012-05-17 ✅ Patent 8,471,227 granted on 2013-06-25Extreme ultraviolet light source apparatus
#12 | 2012-04-19 ✅ Patent 8,558,202 granted on 2013-10-15Extreme ultraviolet light source apparatus
#13 | 2012-03-22 ✅ Patent 8,476,609 granted on 2013-07-02Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device, and method for controlling saturable absorber used in extreme ultraviolet light source device
#14 | 2011-11-24 ✅ Patent 8,710,472 granted on 2014-04-29Target output device and extreme ultraviolet light source apparatus
#15 | 2011-10-27LASER SYSTEM
#16 | 2011-07-28 ✅ Patent 8,294,129 granted on 2012-10-23Extreme ultraviolet light source apparatus
#17 | 2011-07-21 ✅ Patent 8,445,877 granted on 2013-05-21Extreme ultraviolet light source apparatus and target supply device
#18 | 2011-07-07 ✅ Patent 8,354,657 granted on 2013-01-15Extreme ultra violet light source apparatus
#19 | 2011-06-30 ✅ Patent 8,503,499 granted on 2013-08-06Gas discharge chamber
#20 | 2011-05-05 ✅ Patent 8,471,226 granted on 2013-06-25Extreme ultraviolet light source device and method for producing extreme ultraviolet light
#21 | 2010-08-12 ✅ Patent 8,610,095 granted on 2013-12-17Extreme ultraviolet light source device
#22 | 2010-07-22 ✅ Patent 8,258,492 granted on 2012-09-04Differential evacuation system
#23 | 2010-07-15 ✅ Patent 7,923,705 granted on 2011-04-12Extreme ultra violet light source apparatus
#24 | 2010-07-08 ✅ Patent 8,173,984 granted on 2012-05-08Extreme ultraviolet light source apparatus
#25 | 2010-06-10 ✅ Patent 8,343,429 granted on 2013-01-01Target supply unit of extreme ultraviolet light source apparatus and method of manufacturing the same
#26 | 2010-05-27 ✅ Patent 8,165,181 granted on 2012-04-24Polarization purity control device and gas laser apparatus provided with the same
#27 | 2010-05-13 ✅ Patent 8,242,472 granted on 2012-08-14Extreme ultraviolet light source device and control method for extreme ultraviolet light source device
#28 | 2010-04-01 ✅ Patent 8,093,571 granted on 2012-01-10Extreme ultraviolet light source device, laser light source device for extreme ultraviolet light source device and method for controlling saturable absorber used in extreme ultraviolet light source device
#29 | 2010-04-01 ✅ Patent 8,399,867 granted on 2013-03-19Extreme ultraviolet light source apparatus
#30 | 2010-04-01 ✅ Patent 8,395,133 granted on 2013-03-12Apparatus and method of adjusting a laser light source for an EUV source device
#31 | 2010-03-04 ✅ Patent 7,965,756 granted on 2011-06-21Optical element for gas laser and gas laser apparatus using the same
#32 | 2010-03-04 ✅ Patent 9,052,615 granted on 2015-06-09Extreme ultraviolet light source apparatus
#33 | 2010-02-04 ✅ Patent 8,853,656 granted on 2014-10-07Extreme ultraviolet light source device
#34 | 2010-01-28 ✅ Patent 8,003,962 granted on 2011-08-23Extreme ultraviolet light source apparatus and nozzle protection device
#35 | 2009-12-24 ✅ Patent 7,903,715 granted on 2011-03-08Slab type laser apparatus
#36 | 2009-11-26 ✅ Patent 8,198,613 granted on 2012-06-12Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device
#37 | 2009-10-29 ✅ Patent 8,227,778 granted on 2012-07-24Semiconductor exposure device using extreme ultra violet radiation
#38 | 2009-09-17 ✅ Patent 8,000,361 granted on 2011-08-16Laser system
#39 | 2009-09-10 ✅ Patent 8,212,228 granted on 2012-07-03Extreme ultra violet light source apparatus
#40 | 2008-04-17 ✅ Patent 7,915,600 granted on 2011-03-29Extreme ultra violet light source apparatus
#41 | 2008-04-10 ✅ Patent 7,705,333 granted on 2010-04-27Extreme ultra violet light source apparatus
#42 | 2007-12-27 ✅ Patent 7,957,449 granted on 2011-06-07Two-stage laser system for aligners
#43 | 2007-10-04 ✅ Patent 7,615,766 granted on 2009-11-10Target supplier
#44 | 2007-10-04 ✅ Patent 8,143,606 granted on 2012-03-27Extreme ultra violet light source device
#45 | 2007-08-16 ✅ Patent 7,649,188 granted on 2010-01-19LPP type extreme ultra violet light source apparatus and driver laser for the same
#46 | 2007-07-26 ✅ Patent 7,608,846 granted on 2009-10-27Extreme ultra violet light source device
#47 | 2007-03-27 ✅ Patent 7,196,796 granted on 2007-03-27Wavelength detecting apparatus, laser apparatus, and wavelength detecting method
#48 | 2006-11-09 ✅ Patent 7,297,968 granted on 2007-11-20Debris collector for EUV light generator
#49 | 2006-10-26 ✅ Patent 7,382,816 granted on 2008-06-03Two-stage laser pulse energy control device and two-stage laser system
#50 | 2006-08-24 ✅ Patent 7,271,401 granted on 2007-09-18Extreme ultra violet light source device
#51 | 2006-07-04 ✅ Patent 7,072,375 granted on 2006-07-04Line-narrowed gas laser system
#52 | 2006-06-27 ✅ Patent 7,067,832 granted on 2006-06-27Extreme ultraviolet light source
#53 | 2006-04-13 ✅ Patent 7,215,695 granted on 2007-05-08Discharge excitation type pulse laser apparatus
#54 | 2006-04-13 ✅ Patent 7,680,158 granted on 2010-03-16LPP type extreme ultra violet light source apparatus and driver laser for the same
#55 | 2006-02-28 ✅ Patent 7,006,309 granted on 2006-02-28Prism unit and laser device
#56 | 2005-09-22 ✅ Patent 7,078,717 granted on 2006-07-18Light source device and exposure equipment using the same
#57 | 2005-08-04 ✅ Patent 6,987,279 granted on 2006-01-17Light source device and exposure equipment using the same
#58 | 2005-07-26 ✅ Patent 6,922,428 granted on 2005-07-26Gas laser apparatus for lithography
#59 | 2005-04-12 ✅ Patent 6,879,617 granted on 2005-04-12Two stage laser system
Also check out Gigaphoton Inc.'s (Tokyo, Japan) applicant profile with 2 patent applications submitted.
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