Shanghai Huali Microelectronics Corporation

City:

Country:

China

Published Applications:

Last publication date:

2023-08-24

Patent Grants:

Last grant date:

2025-05-20

Top Inventors for applications by Shanghai Huali Microelectronics Corporation

These are the the leading inventors for applications assigned to Shanghai Huali Microelectronics Corporation:

Qiwei Wang 1 Shanghai, China
Shaokang Yao 1 Shanghai, China
Chunsheng Zheng 1 Shanghai, China
Haoyu Chen 1 Shanghai, China

Yuhong LANG 1 Shanghai, China
Xinxing TU 1 Shanghai, China
Chunsheng Zheng 1 Pudong, China

Recent patent applications by Shanghai Huali Microelectronics Corporation

Shanghai Huali Microelectronics Corporation based in , CN has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2023-08-24 ✅ Patent 12,305,276 granted on 2025-05-20

US20230265557A1

Chemistry; metallurgy

Method for purge clean of low pressure furnace

#2 | 2023-05-25 ✅ Patent 12,349,343 granted on 2025-07-01

US20230164992A1

Electricity

METHOD FOR MAKING ACTIVE AREA AIR GAP

#3 | 2013-10-17 ✅ Patent 8,927,350 granted on 2015-01-06

US20130273702A1

Electricity

Integration flow for LDD and spacer fabrication on a sacrificial amorphous carbon gate structure

AssigneeID:

488344 ⎘