CLEAN TECHNOLOGY CO., LTD.

City:

Osaka

Country:

Japan

Published Applications:

Last publication date:

2023-09-28

Patent Grants:

Last grant date:

2026-03-17

Top Inventors for applications by CLEAN TECHNOLOGY CO., LTD.

These are the the leading inventors for applications assigned to CLEAN TECHNOLOGY CO., LTD.:

Toshio AWAJI 3 Osaka, Japan
Toshio Tanaka 1 Hiroshima, Japan
Takashi Nakayama 1 Izumisano-shi, Japan
Toshio AWAJI 1 Sakai-shi, Japan

Toshio Tanaka 1 Hiroshima-shi, Japan
Takashi Nakayama 1 Izumisano, Japan
Toshio Awaji 1 Sakai, Japan

Recent patent applications by CLEAN TECHNOLOGY CO., LTD.

CLEAN TECHNOLOGY CO., LTD. based in Osaka, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2023-09-28 ✅ Patent 12,576,179 granted on 2026-03-17

US20230302186A1

Human necessities

VIRUS REMOVAL DEVICE

#2 | 2023-07-27 ✅ Patent 12,023,622 granted on 2024-07-02

US20230233980A1

Performing operations; transporting

Dust-containing gas treatment apparatus

#3 | 2021-06-17 ✅ Patent 11,633,689 granted on 2023-04-25

US20210178312A1

Performing operations; transporting

Dust-containing gas treatment apparatus

#4 | 2010-10-07 ✅ Patent 9,675,930 granted on 2017-06-13

US20100252411A1

Performing operations; transporting

Control method of plasma by magnetic field in an exhaust gas treating apparatus and an exhaust gas treating apparatus using the same

Also check out Clean Technology Co., Ltd.'s (Osaka, Japan) applicant profile with 3 patent applications submitted.

AssigneeID:

524122 ⎘