DAIWA TECHNO SYSTEMS CO., LTD.

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2014-11-13

Patent Grants:

Last grant date:

2017-07-25

Top Inventors for applications by DAIWA TECHNO SYSTEMS CO., LTD.

These are the the leading inventors for applications assigned to DAIWA TECHNO SYSTEMS CO., LTD.:

Hiroshi Satoh 1 Machida, Japan
Hiroshi Sato 1 Tokyo, Japan
Takeshi SHIRATO 1 Chiba, Japan
Masamichi OSAWA 1 Tokyo, Japan

Yuuji Honda 1 Chiba, Japan

Recent patent applications by DAIWA TECHNO SYSTEMS CO., LTD.

DAIWA TECHNO SYSTEMS CO., LTD. based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2014-11-13 ✅ Patent 9,714,468 granted on 2017-07-25

US20140335281A1

Chemistry; metallurgy

Film-forming method of an osmium film

#2 | 2005-02-22 ✅ Patent 6,858,263 granted on 2005-02-22

US10067542

Method of manufacturing aperture plate

Also check out Daiwa Techno Systems Co., Ltd.'s (Tokyo, Japan) applicant profile with 1 patent applications submitted.

AssigneeID:

526192 ⎘