Assignee profile:

SEN CORPORATION

City:

Tokyo

Country:

Japan

Published Applications:

34

Last publication date:

2015-06-25

Patent Grants:

33

Last grant date:

2015-10-06

Top Inventors for applications by SEN CORPORATION

These are the the leading inventors for applications assigned to SEN CORPORATION:

Recent patent applications by SEN CORPORATION

SEN CORPORATION based in Tokyo, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2015-06-25 ✅ Patent 9,153,406 granted on 2015-10-06
US20150179385A1
Electricity

Supporting structure and ion generator using the same

#2 | 2015-03-05 ✅ Patent 9,343,262 granted on 2016-05-17
US20150064888A1
Electricity

Ion implantation apparatus, beam parallelizing apparatus, and ion implantation method

#3 | 2015-03-05 ✅ Patent 9,117,627 granted on 2015-08-25
US20150064887A1
Electricity

Ion implantation apparatus and ion implantation method

#4 | 2014-12-25 ✅ Patent 8,952,340 granted on 2015-02-10
US20140374617A1
Electricity

High-frequency acceleration type ion acceleration and transportation apparatus having high energy precision

#5 | 2014-12-04 ✅ Patent 9,281,160 granted on 2016-03-08
US20140353518A1
Electricity

Insulation structure and insulation method

#6 | 2014-12-04 ✅ Patent 8,987,690 granted on 2015-03-24
US20140353517A1
Electricity

High-energy ion implanter

#7 | 2014-12-04 ✅ Patent 9,390,890 granted on 2016-07-12
US20140352615A1
Chemistry; metallurgy

High-energy ion implanter

#8 | 2014-11-27 ✅ Patent 9,355,847 granted on 2016-05-31
US20140345522A1
Electricity

High-energy ion implanter

#9 | 2014-10-02 ✅ Patent 9,117,630 granted on 2015-08-25
US20140291543A1
Electricity

Insulation structure of high voltage electrodes for ion implantation apparatus

#10 | 2014-09-25 ✅ Patent 10,030,304 granted on 2018-07-24
US20140283745A1
Chemistry; metallurgy

Ion implantation apparatus and method of cleaning ion implantation apparatus

#11 | 2014-08-21 ✅ Patent 9,165,772 granted on 2015-10-20
US20140235042A1
Electricity

Ion implantation method and ion implantation apparatus

#12 | 2014-06-05 ✅ Patent 9,466,467 granted on 2016-10-11
US20140150723A1
Chemistry; metallurgy

Ion implantation apparatus

#13 | 2014-05-15 ✅ Patent 9,208,996 granted on 2015-12-08
US20140134833A1
Electricity

Ion implantation apparatus and ion implantation method

#14 | 2014-03-06 ✅ Patent 9,379,030 granted on 2016-06-28
US20140065737A1
Electricity

Ion implantation method and ion implantation apparatus

#15 | 2014-03-06 ✅ Patent 9,208,983 granted on 2015-12-08
US20140062286A1
Electricity

Ion generation method and ion source

#16 | 2014-01-16 ✅ Patent 8,980,654 granted on 2015-03-17
US20140017825A1
Electricity

Ion implantation method and ion implantation apparatus

#17 | 2013-10-03 ✅ Patent 8,692,216 granted on 2014-04-08
US20130256566A1
Electricity

Ion implantation apparatus and control method thereof

#18 | 2013-09-26 ✅ Patent 9,153,405 granted on 2015-10-06
US20130249400A1
Electricity

Ion source device and ion beam generating method

#19 | 2013-08-01 ✅ Patent 9,305,784 granted on 2016-04-05
US20130196492A1
Electricity

Ion implantation method and ion implantation apparatus

#20 | 2013-06-20 ✅ Patent 9,646,837 granted on 2017-05-09
US20130157390A1
Electricity

Ion implantation method and ion implantation apparatus

#21 | 2013-04-18 ✅ Patent 8,759,801 granted on 2014-06-24
US20130092825A1
Electricity

Ion implantation apparatus and ion implantation method

#22 | 2013-01-24 ✅ Patent 9,312,163 granted on 2016-04-12
US20130019797A1
Electricity

Impurity-doped layer formation apparatus and electrostatic chuck protection method

#23 | 2012-12-20 ✅ Patent 9,601,314 granted on 2017-03-21
US20120322248A1
Electricity

Ion implantation apparatus and ion implantation method

#24 | 2012-10-04 ✅ Patent 8,772,741 granted on 2014-07-08
US20120252194A1
Electricity

Ion implantation method and ion implantation apparatus

#25 | 2012-09-27 ✅ Patent 8,772,142 granted on 2014-07-08
US20120244691A1
Electricity

Ion implantation method and ion implantation apparatus

#26 | 2012-03-01 ✅ Patent 9,023,720 granted on 2015-05-05
US20120052664A1
Electricity

Manufacturing method of semiconductor device

#27 | 2012-01-19
US20120015507A1
Electricity

PLASMA DOPING APPARATUS AND PLASMA DOPING METHOD

#28 | 2011-12-08 ✅ Patent 8,735,855 granted on 2014-05-27
US20110297842A1
Electricity

Ion beam irradiation system and ion beam irradiation method

#29 | 2011-06-09 ✅ Patent 8,163,635 granted on 2012-04-24
US20110136329A1
Electricity

Manufacturing method of semiconductor device

#30 | 2008-10-23 ✅ Patent 7,982,192 granted on 2011-07-19
US20080258074A1
Electricity

Beam processing apparatus

#31 | 2008-10-16 ✅ Patent 7,755,067 granted on 2010-07-13
US20080251734A1
Electricity

Ion implantation apparatus and method of converging/shaping ion beam used therefor

#32 | 2008-03-20 ✅ Patent 7,718,980 granted on 2010-05-18
US20080067397A1
Electricity

Beam processing system and beam processing method

#33 | 2008-01-03 ✅ Patent 7,411,709 granted on 2008-08-12
US20080002244A1
Electricity

Beam processing system and beam processing method

#34 | 2006-06-01 ✅ Patent 7,429,743 granted on 2008-09-30
US20060113493A1
Electricity

Irradiation system ion beam and method to enhance accuracy of irradiation

Also check out Sen Corporation's (Tokyo, Japan) applicant profile with 12 patent applications submitted.

AssigneeID:

5316 ⎘