TANAH PROCESS, LTD.

City:

Osaka-shi

Country:

Japan

Published Applications:

Last publication date:

2017-05-18

Patent Grants:

Last grant date:

2018-11-20

Top Inventors for applications by TANAH PROCESS, LTD.

These are the the leading inventors for applications assigned to TANAH PROCESS, LTD.:

Rongfu Lu 1 Makinohara, Japan
Masato Fujiwara 1 Higashimurayama, Japan
Masakazu Tanahashi 1 Osaka-shi, Japan
Masato Fujiwara 1 Higashimurayama-shi, Japan

Rongfu LU 1 Makinohara-shi, Japan
Junichi WATANABE 1 Osaka, Japan
Junichi WATANABE 1 Osaka-shi, Japan
Masakazu Tanahashi 1 Osaka, Japan

Recent patent applications by TANAH PROCESS, LTD.

TANAH PROCESS, LTD. based in Osaka-shi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2017-05-18 ✅ Patent 10,131,555 granted on 2018-11-20

US20170137305A1

Chemistry; metallurgy

Method and apparatus for controlling concentration of free chlorine, and sterilization method and sterilization apparatus each utilizing said method and said apparatus

AssigneeID:

547024 ⎘