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Assignee profile:

V. Technology Co., Ltd.

City:

Yokohama

Country:

Japan

Published Applications:

Last publication date:

2023-11-09

Patent Grants:

Last grant date:

2025-11-25

Top Inventors for applications by V. Technology Co., Ltd.

These are the the leading inventors for applications assigned to V. Technology Co., Ltd.:

Michinobu Mizumura 5 Yokohama, Japan
Michinobu MIZUMURA 4 Yokohama-shi, Japan
Yingbao Yang 1 Kanagawa, Japan
Jun GOTOH 1 Yokohama-shi, Kanagawa, Japan

Ryo Noguchi 1 Yokohama-shi, Japan
Shuji Kudo 1 Yokohama, Japan
Jun GOTOH 1 Kanagawa, Japan
Ryo Noguchi 1 Yokohama, Japan

Masakazu Tanaka 1 Sakai, Japan
Yoshihiro SHIOAKU 1 Kanagawa, Japan
Jun Gotoh 1 Yokohama, Japan
Takao Matsumoto 1 Sakai, Japan

Shuji KUDO 1 Yokohama-shi, Japan
Yoshiaki Matsushima 1 Sakai, Japan
Zhihua HAN 1 Yokohama-shi, Japan
Yuji SAITO 1 Yokohama, Japan

Yoshiyuki Enomoto 1 Kanagawa, Japan
Kaori Saito 1 Yokohama, Japan
Koichi Kajiyama 1 Yokohama, Japan
Kaori SAITO 1 Yokohama-shi, Kanagawa, Japan

Michinobu MIZUMURA 1 Kanagawa, Japan
Hiroshi Ikenoue 1 Fukuoka, Japan
Koichi KAJIYAMA 1 Yokohama-shi, Japan
Zhihua Han 1 Yokohama, Japan

Yuya Fujimori 1 Yokohama-shi, Japan
Hiroshi IKENOUE 1 Fukuoka-shi, Fukuoka, Japan
Nobutake Nodera 1 Sakai, Japan
Yuya Fujimori 1 Yokohama, Japan

Yuji SAITO 1 Yokohama-shi, Japan

Recent patent applications by V. Technology Co., Ltd.

V. Technology Co., Ltd. based in Yokohama, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2023-11-09 ✅ Patent 12,481,221 granted on 2025-11-25

US20230359126A1

Physics

PROJECTION EXPOSURE DEVICE AND PROJECTION EXPOSURE METHOD

#2 | 2023-01-26 ✅ Patent 11,791,160 granted on 2023-10-17

US20230027404A1

Electricity

Polycrystalline film, method for forming polycrystalline film, laser crystallization device and semiconductor device

#3 | 2022-01-06 ✅ Patent 12,148,616 granted on 2024-11-19

US20220005692A1

Electricity

Laser annealing method, laser annealing device, and crystallized silicon film substrate

#4 | 2020-06-25 ✅ Patent 10,920,311 granted on 2021-02-16

US20200199732A1

Chemistry; metallurgy

Deposition mask, method for manufacturing the same, and method for repairing the same

#5 | 2020-02-27 ✅ Patent 10,971,361 granted on 2021-04-06

US20200066517A1

Electricity

Laser annealing method, laser annealing apparatus, and thin film transistor substrate

#6 | 2019-10-10 ✅ Patent 10,840,095 granted on 2020-11-17

US20190311899A1

Electricity

Laser irradiation device, thin-film transistor and thin-film transistor manufacturing method

#7 | 2019-08-29 ✅ Patent 10,896,817 granted on 2021-01-19

US20190267235A1

Electricity

Laser irradiation apparatus, thin film transistor, and method of manufacturing thin film transistor

#8 | 2019-05-23 ✅ Patent 10,608,115 granted on 2020-03-31

US20190157462A1

Electricity

Laser beam irradiation device, thin-film transistor, and method of manufacturing thin-film transistor

#9 | 2018-06-14 ✅ Patent 10,381,417 granted on 2019-08-13

US20180166505A1

Electricity

White light-emitting device

Also check out V Technology Co., Ltd.'s (Yokohama, Japan) applicant profile with 9 patent applications submitted.

AssigneeID:

559581 ⎘