NIKON-ESSILOR CO., LTD.

City:

Country:

Japan

Published Applications:

Last publication date:

2017-03-30

Patent Grants:

Last grant date:

2019-08-20

Top Inventors for applications by NIKON-ESSILOR CO., LTD.

These are the the leading inventors for applications assigned to NIKON-ESSILOR CO., LTD.:

Yukio HONMA 1 Tokyo, Japan

Recent patent applications by NIKON-ESSILOR CO., LTD.

NIKON-ESSILOR CO., LTD. based in , JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2017-03-30 ✅ Patent 10,386,652 granted on 2019-08-20

US20170090214A1

Physics

Lens design method, lens manufacturing method, storage medium, and lens design system

AssigneeID:

559871 ⎘