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Assignee profile:

SYNOS TECHNOLOGY, INC.

City:

Fremont, California

Country:

United States

Published Applications:

16

Last publication date:

2014-03-06

Patent Grants:

11

Last grant date:

2014-05-13

Top Inventors for applications by SYNOS TECHNOLOGY, INC.

These are the the leading inventors for applications assigned to SYNOS TECHNOLOGY, INC.:

Recent patent applications by SYNOS TECHNOLOGY, INC.

SYNOS TECHNOLOGY, INC. based in Fremont, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2014-03-06
US20140065307A1
Performing operations; transporting

COOLING SUBSTRATE AND ATOMIC LAYER DEPOSITION APPARATUS USING PURGE GAS

 #2 | 2014-01-30
US20140030447A1
Chemistry; metallurgy

Deposition of Graphene or Conjugated Carbons Using Radical Reactor

 #3 | 2014-01-30 ✅ Patent 8,722,526 granted on 2014-05-13
US20140027777A1
Chemistry; metallurgy

Growing of gallium-nitrade layer on silicon substrate

 #4 | 2013-12-19
US20130337172A1
Chemistry; metallurgy

REACTOR IN DEPOSITION DEVICE WITH MULTI-STAGED PURGING STRUCTURE

 #5 | 2013-10-03 ✅ Patent 9,145,608 granted on 2015-09-29
US20130260034A1
Chemistry; metallurgy

Scanning injector assembly module for processing substrate

 #6 | 2013-09-12 ✅ Patent 9,177,788 granted on 2015-11-03
US20130237065A1
Electricity

Plasma reactor with conductive member in reaction chamber for shielding substrate from undesirable irradiation

 #7 | 2013-05-16 ✅ Patent 9,051,637 granted on 2015-06-09
US20130122197A1
Chemistry; metallurgy

Securing of shadow mask and substrate on susceptor of deposition apparatus

 #8 | 2013-04-18
US20130092085A1
Chemistry; metallurgy

LINEAR ATOMIC LAYER DEPOSITION APPARATUS

 #9 | 2013-01-24 ✅ Patent 8,617,652 granted on 2013-12-31
US20130023172A1
Textiles; paper

Depositing material on fibrous textiles using atomic layer deposition for increasing rigidity and strength

 #10 | 2013-01-24
US20130022658A1
Textiles; paper

DEPOSITING MATERIAL WITH ANTIMICROBIAL PROPERTIES ON PERMEABLE SUBSTRATE USING ATOMIC LAYER DEPOSITION

 #11 | 2012-11-29 ✅ Patent 8,501,633 granted on 2013-08-06
US20120302071A1
Electricity

Forming substrate structure by filling recesses with deposition material

 #12 | 2012-11-29 ✅ Patent 8,895,108 granted on 2014-11-25
US20120301632A1
Chemistry; metallurgy

Method for forming thin film using radicals generated by plasma

 #13 | 2010-08-26 ✅ Patent 8,257,799 granted on 2012-09-04
US20100215871A1
Chemistry; metallurgy

Method for forming thin film using radicals generated by plasma

 #14 | 2010-02-18 ✅ Patent 8,470,718 granted on 2013-06-25
US20100041213A1
Electricity

Vapor deposition reactor for forming thin film

 #15 | 2010-02-18 ✅ Patent 8,263,502 granted on 2012-09-11
US20100041179A1
Electricity

Forming substrate structure by filling recesses with deposition material

 #16 | 2009-07-02 ✅ Patent 8,333,839 granted on 2012-12-18
US20090165715A1
Chemistry; metallurgy

Vapor deposition reactor

Also check out Synos Technology, Inc.'s (Fremont, United States) applicant profile with 3 patent applications submitted.

AssigneeID:

5888 ⎘