AGC Si-Tech Co., Ltd.

City:

Kitakyushu

Country:

Japan

Published Applications:

Last publication date:

2023-05-04

Patent Grants:

Last grant date:

2024-12-03

Top Inventors for applications by AGC Si-Tech Co., Ltd.

These are the the leading inventors for applications assigned to AGC Si-Tech Co., Ltd.:

Hyunji KIM 2 Chiyoda-ku, Japan
Toshiya MATSUBARA 2 Chiyoda-ku, Japan
Hiroyuki KAMIYA 2 Chiyoda-ku, Japan
Hajime KATAYAMA 1 Tokyo, Japan

Takeshi MURAKAMI 1 Fukuoka, Japan
Toshiya MATSUBARA 1 Tokyo, Japan
Hyunji KIM 1 Tokyo, Japan
Yusuke ARAI 1 Tokyo, Japan

Recent patent applications by AGC Si-Tech Co., Ltd.

AGC Si-Tech Co., Ltd. based in Kitakyushu, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2023-05-04 ✅ Patent 12,157,673 granted on 2024-12-03

US20230138940A1

Chemistry; metallurgy

Method for producing hollow silica particles

#2 | 2023-02-16 ✅ Patent 12,521,323 granted on 2026-01-13

US20230052900A1

Human necessities

HYDROXYAPATITE-SUPPORTING POROUS SILICA PARTICLES, METHOD FOR PRODUCING HYDROXYAPATITE-SUPPORTING POROUS SILICA PARTICLES, AND COMPOSITION COMPRISING HYDROXYAPATITE-SUPPORTING POROUS SILICA PARTICLES

#3 | 2022-12-29 ✅ Patent 12,459,826 granted on 2025-11-04

US20220411275A1

Chemistry; metallurgy

HOLLOW SILICA PARTICLES AND METHOD FOR MANUFACTURING HOLLOW SILICA PARTICLES

#4 | 2020-09-10 ✅ Patent 11,608,273 granted on 2023-03-21

US20200283300A1

Chemistry; metallurgy

Method for producing hollow silica particles

Also check out AGC Si-Tech Co., Ltd.'s (Kitakyushu, Japan) applicant profile with 4 patent applications submitted.

AssigneeID:

597235 ⎘