JEPLAN, INC.

City:

Kanagawa

Country:

Japan

Published Applications:

Last publication date:

2025-02-20

Patent Grants:

Last grant date:

Top Inventors for applications by JEPLAN, INC.

These are the the leading inventors for applications assigned to JEPLAN, INC.:

Damien LEINEKUGEL LE COCQ 3 Rueil-Malmaison Cedex, France
DAVID CHICHE 3 RUEIL-MALMAISON CEDEX, France
Guillaume BLANCKE 3 Rueil-Malmaison Cedex, France
Frédéric FAVRE 2 Rueil-Malmaison Cedex, France

Adrien MEKKI-BERRADA 2 Rueil-Malmaison Cedex, France
Charles-Philippe LIENEMANN 1 RUEIL-MALMAISON CEDEX, France
Yacine HAROUN 1 RUEIL-MALMAISON CEDEX, France
Cyprien CHARRA 1 Rueil-Malmaison Cedex, France

Olivier THINON 1 Rueil-Malmaison Cedex, France
Mayara AZIN GONDIM PAIVA 1 RUEIL-MALMAISON CEDEX, France
Charles BONNIN 1 RUEIL-MALMAISON CEDEX, France

Recent patent applications by JEPLAN, INC.

JEPLAN, INC. based in Kanagawa, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2025-02-20

US20250059318A1

Chemistry; metallurgy

BIS(2-HYDROXYETHYL) TEREPHTHALATE WITH LOW NITROGEN CONTENT

#2 | 2024-10-24

US20240351973A1

Chemistry; metallurgy

METHOD FOR PURIFYING A TEREPHTHALATE DIESTER MONOMER BY ADSORPTION

#3 | 2024-08-29

US20240287279A1

Chemistry; metallurgy

METHOD FOR PRODUCING A PURIFIED AND DECOLOURISED DIESTER MONOMER, BYMEANS OF DEPOLYMERISATION OF A POLYESTER FEEDSTOCK

Also check out JEPLAN, INC.'s (Kanagawa, Japan) applicant profile with 2 patent applications submitted.

AssigneeID:

623328 ⎘