Assignee profile:

PHOTRONICS, INC.

City:

Brookfield, Connecticut

Country:

United States

Published Applications:

37

Last publication date:

2024-08-22

Patent Grants:

35

Last grant date:

2025-04-22

Top Inventors for applications by PHOTRONICS, INC.

These are the the leading inventors for applications assigned to PHOTRONICS, INC.:

Recent patent applications by PHOTRONICS, INC.

PHOTRONICS, INC. based in Brookfield, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2024-08-22 ✅ Patent 12,282,257 granted on 2025-04-22
US20240280908A1
Physics

Pellicle for flat panel display photomask

#2 | 2024-07-18 ✅ Patent 12,249,528 granted on 2025-03-11
US20240242996A1
Electricity

Pellicle removal tool

#3 | 2023-08-31 ✅ Patent 11,948,824 granted on 2024-04-02
US20230274965A1
Electricity

Pellicle removal tool

#4 | 2023-05-25 ✅ Patent 12,013,642 granted on 2024-06-18
US20230161259A1
Physics

Pellicle for flat panel display photomask

#5 | 2021-12-16 ✅ Patent 11,537,050 granted on 2022-12-27
US20210389664A1
Physics

Pellicle for flat panel display photomask

#6 | 2021-12-09 ✅ Patent 11,682,573 granted on 2023-06-20
US20210384057A1
Electricity

Pellicle removal tool

#7 | 2021-11-04 ✅ Patent 12,164,225 granted on 2024-12-10
US20210341832A1
Physics

System, method, and program product for manufacturing a photomask

#8 | 2018-10-25 ✅ Patent 11,183,410 granted on 2021-11-23
US20180307133A1
Physics

Pellicle removal tool

#9 | 2016-07-21 ✅ Patent 9,933,611 granted on 2018-04-03
US20160209639A1
Physics

Microfluidic thermoptic energy processor

#10 | 2014-09-18
US20140272688A1
Physics

GRAYSCALE LITHOGRAPHY OF PHOTO DEFINABLE GLASS

#11 | 2014-07-24 ✅ Patent 9,304,334 granted on 2016-04-05
US20140204450A1
Mechanical engineering

Microfluidic thermoptic energy processor

#12 | 2014-05-29
US20140146636A1
Performing operations; transporting

MIXER CHIP

#13 | 2011-04-14 ✅ Patent 9,005,849 granted on 2015-04-14
US20110086511A1
Physics

Photomask having a reduced field size and method of using the same

#14 | 2010-07-08 ✅ Patent 7,910,269 granted on 2011-03-22
US20100174393A1
Physics

Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same

#15 | 2010-05-27 ✅ Patent 9,005,848 granted on 2015-04-14
US20100129736A1
Physics

Photomask having a reduced field size and method of using the same

#16 | 2008-10-23 ✅ Patent 7,943,273 granted on 2011-05-17
US20080261127A1
Physics

Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same

#17 | 2008-10-23 ✅ Patent 7,851,110 granted on 2010-12-14
US20080261126A1
Physics

Secure photomask with blocking aperture

#18 | 2008-10-23 ✅ Patent 7,790,340 granted on 2010-09-07
US20080261123A1
Physics

Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same

#19 | 2008-10-23 ✅ Patent 8,102,031 granted on 2012-01-24
US20080258754A1
Electricity

Security element for an integrated circuit, integrated circuit including the same, and method for securing an integrated circuit

#20 | 2008-04-01 ✅ Patent 7,351,503 granted on 2008-04-01
US10733723
-

Fused silica pellicle in intimate contact with the surface of a photomask

#21 | 2006-09-21 ✅ Patent 7,473,500 granted on 2009-01-06
US20060210891A1
Physics

Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same

#22 | 2006-02-07 ✅ Patent 6,996,450 granted on 2006-02-07
US10852532
-

Automated manufacturing system and method for processing photomasks

#23 | 2005-12-15 ✅ Patent 7,356,374 granted on 2008-04-08
US20050278046A1
Physics

Comprehensive front end method and system for automatically generating and processing photomask orders

#24 | 2005-12-15 ✅ Patent 7,435,533 granted on 2008-10-14
US20050277033A1
Physics

Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases

#25 | 2005-12-15 ✅ Patent 7,396,617 granted on 2008-07-08
US20050277032A1
Physics

Photomask reticle having multiple versions of the same mask pattern with different biases

#26 | 2005-11-03 ✅ Patent 7,480,539 granted on 2009-01-20
US20050246049A1
Physics

Automated manufacturing system and method for processing photomasks

#27 | 2005-09-22 ✅ Patent 7,312,004 granted on 2007-12-25
US20050208390A1
Physics

Embedded attenuated phase shift mask with tunable transmission

#28 | 2005-08-23 ✅ Patent 6,933,084 granted on 2005-08-23
US10391001
-

Alternating aperture phase shift photomask having light absorption layer

#29 | 2005-08-04 ✅ Patent 7,344,824 granted on 2008-03-18
US20050170288A1
Physics

Alternating aperture phase shift photomask having light absorption layer

#30 | 2005-06-30 ✅ Patent 7,640,529 granted on 2009-12-29
US20050144088A1
Physics

User-friendly rule-based system and method for automatically generating photomask orders

#31 | 2005-06-21 ✅ Patent 6,908,716 granted on 2005-06-21
US10839025
-

Disposable hard mask for photomask plasma etching

#32 | 2005-06-02 ✅ Patent 7,074,530 granted on 2006-07-11
US20050118515A1
Physics

Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same

#33 | 2005-03-15 ✅ Patent 6,868,209 granted on 2005-03-15
US10369262
-

Method for fabricating chirped fiber Bragg gratings

#34 | 2005-03-10 ✅ Patent 7,669,167 granted on 2010-02-23
US20050055659A1
Physics

Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system

#35 | 2005-03-10 ✅ Patent 7,049,034 granted on 2006-05-23
US20050053847A1
Physics

Photomask having an internal substantially transparent etch stop layer

#36 | 2005-02-15 ✅ Patent 6,855,463 granted on 2005-02-15
US10229830
-

Photomask having an intermediate inspection film layer

#37 | 2005-01-11 ✅ Patent 6,842,881 granted on 2005-01-11
US10209254
-

Rule based system and method for automatically generating photomask orders in a specified order format

Also check out PHOTRONICS, INC.'s (Brookfield, United States) applicant profile with 14 patent applications submitted.

AssigneeID:

66173 ⎘