Assignee profile:

ASM NuTool, Inc.

City:

Fremont, California

Country:

United States

Published Applications:

25

Last publication date:

2006-12-12

Patent Grants:

25

Last grant date:

2006-12-12

Top Inventors for applications by ASM NuTool, Inc.

These are the the leading inventors for applications assigned to ASM NuTool, Inc.:

Recent patent applications by ASM NuTool, Inc.

ASM NuTool, Inc. based in Fremont, US has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2006-12-12 ✅ Patent 7,147,766 granted on 2006-12-12
US10407892
-

Chip interconnect and packaging deposition methods and structures

#2 | 2006-06-13 ✅ Patent 7,059,944 granted on 2006-06-13
US10369118
-

Integrated system for processing semiconductor wafers

#3 | 2006-05-16 ✅ Patent 7,045,040 granted on 2006-05-16
US10692952
-

Process and system for eliminating gas bubbles during electrochemical processing

#4 | 2006-04-18 ✅ Patent 7,029,567 granted on 2006-04-18
US10327609
-

Electrochemical edge and bevel cleaning process and system

#5 | 2006-01-24 ✅ Patent 6,988,932 granted on 2006-01-24
US10788926
-

Apparatus of sealing wafer backside for full-face processing

#6 | 2005-12-13 ✅ Patent 6,974,769 granted on 2005-12-13
US10663318
-

Conductive structure fabrication process using novel layered structure and conductive structure fabricated thereby for use in multi-level metallization

#7 | 2005-11-29 ✅ Patent 6,969,456 granted on 2005-11-29
US10041029
-

Method of using vertically configured chamber used for multiple processes

#8 | 2005-11-22 ✅ Patent 6,967,166 granted on 2005-11-22
US10122646
-

Method for monitoring and controlling force applied on workpiece surface during electrochemical mechanical processing

#9 | 2005-10-25 ✅ Patent 6,958,114 granted on 2005-10-25
US10093185
-

Method and apparatus for forming an electrical contact with a semiconductor substrate

#10 | 2005-10-11 ✅ Patent 6,953,392 granted on 2005-10-11
US9795687
-

Integrated system for processing semiconductor wafers

#11 | 2005-09-20 ✅ Patent 6,946,066 granted on 2005-09-20
US10201604
-

Multi step electrodeposition process for reducing defects and minimizing film thickness

#12 | 2005-09-13 ✅ Patent 6,942,780 granted on 2005-09-13
US10460032
-

Method and apparatus for processing a substrate with minimal edge exclusion

#13 | 2005-09-13 ✅ Patent 6,943,112 granted on 2005-09-13
US10379265
-

Defect-free thin and planar film processing

#14 | 2005-09-13 ✅ Patent 6,942,546 granted on 2005-09-13
US10321150
-

Endpoint detection for non-transparent polishing member

#15 | 2005-09-06 ✅ Patent 6,939,203 granted on 2005-09-06
US10632481
-

Fluid bearing slide assembly for workpiece polishing

#16 | 2005-09-06 ✅ Patent 6,939,206 granted on 2005-09-06
US10159295
-

Method and apparatus of sealing wafer backside for full-face electrochemical plating

#17 | 2005-08-30 ✅ Patent 6,936,154 granted on 2005-08-30
US10017494
-

Planarity detection methods and apparatus for electrochemical mechanical processing systems

#18 | 2005-08-23 ✅ Patent 6,932,679 granted on 2005-08-23
US10295197
-

Apparatus and method for loading a wafer in polishing system

#19 | 2005-08-09 ✅ Patent 6,926,589 granted on 2005-08-09
US10105016
-

Chemical mechanical polishing apparatus and methods using a flexible pad and variable fluid flow for variable polishing

#20 | 2005-07-26 ✅ Patent 6,921,551 granted on 2005-07-26
US9961193
-

Plating method and apparatus for controlling deposition on predetermined portions of a workpiece

#21 | 2005-06-21 ✅ Patent 6,908,368 granted on 2005-06-21
US10614311
-

Advanced Bi-directional linear polishing system and method

#22 | 2005-06-14 ✅ Patent 6,905,588 granted on 2005-06-14
US9905335
-

Packaging deposition methods

#23 | 2005-06-07 ✅ Patent 6,902,659 granted on 2005-06-07
US10238665
-

Method and apparatus for electro-chemical mechanical deposition

#24 | 2005-04-26 ✅ Patent 6,884,334 granted on 2005-04-26
US10041058
-

Vertically configured chamber used for multiple processes

#25 | 2005-03-15 ✅ Patent 6,866,763 granted on 2005-03-15
US10427309
-

Method and system monitoring and controlling film thickness profile during plating and electroetching

AssigneeID:

682233 ⎘