Semiconductor Leading Edge Technologies, Inc.

City:

Kanagawa

Country:

Japan

Published Applications:

Last publication date:

2006-01-31

Patent Grants:

Last grant date:

2006-01-31

Top Inventors for applications by Semiconductor Leading Edge Technologies, Inc.

These are the the leading inventors for applications assigned to Semiconductor Leading Edge Technologies, Inc.:

Hiroki ARAI 1 Tokyo, Japan
Jeong Yeal Kim 1 Yokohama, Japan
Satoshi Kume 1 Kanagawa, Japan
Ichiro Okabe 1 Kanagawa, Japan

Recent patent applications by Semiconductor Leading Edge Technologies, Inc.

Semiconductor Leading Edge Technologies, Inc. based in Kanagawa, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2006-01-31 ✅ Patent 6,992,013 granted on 2006-01-31

US9597161

Method of forming a fine pattern using a silicon-oxide-based film, semiconductor device with a silicon-oxide-based film and method of manufacture thereof

#2 | 2005-04-19 ✅ Patent 6,880,563 granted on 2005-04-19

US10050161

Apparatus and method of cleaning a substrate

#3 | 2005-04-05 ✅ Patent 6,875,971 granted on 2005-04-05

US10036505

Wafer edge exposure apparatus, and wafer edge exposure method

AssigneeID:

691609 ⎘