Leica Microsystem Lithography GmbH

City:

Jena

Country:

Germany

Published Applications:

Last publication date:

2005-02-22

Patent Grants:

Last grant date:

2005-02-22

Top Inventors for applications by Leica Microsystem Lithography GmbH

These are the the leading inventors for applications assigned to Leica Microsystem Lithography GmbH:

Bastian Niemann 1 Goettingen, Germany
Gerd Schneider 1 Bockenem-Bornum, Germany
Dirk Hambach 1 Munich, Germany

Recent patent applications by Leica Microsystem Lithography GmbH

Leica Microsystem Lithography GmbH based in Jena, DE has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2005-02-22 ✅ Patent 6,859,516 granted on 2005-02-22

US9681186

Method for examining structures on a semiconductor substrate

AssigneeID:

703397 ⎘