Assignee profile:

FUJIMI INCORPORATED

City:

Aichi

Country:

Japan

Published Applications:

61

Last publication date:

2025-01-02

Patent Grants:

42

Last grant date:

2025-12-16

Top Inventors for applications by FUJIMI INCORPORATED

These are the the leading inventors for applications assigned to FUJIMI INCORPORATED:

Recent patent applications by FUJIMI INCORPORATED

FUJIMI INCORPORATED based in Aichi, JP has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:

#1 | 2025-01-02
US20250002756A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD

#2 | 2024-10-17
US20240343943A1
Chemistry; metallurgy

POLISHING COMPOSITION, POLISHING COMPOSITION PRODUCTION METHOD, POLISHING METHOD, AND SEMICONDUCTOR SUBSTRATE PRODUCTION METHOD

#3 | 2024-04-18 ✅ Patent 12,497,540 granted on 2025-12-16
US20240124744A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

#4 | 2024-04-04 ✅ Patent 12,139,643 granted on 2024-11-12
US20240110080A1
Chemistry; metallurgy

Polishing composition

#5 | 2024-03-28 ✅ Patent 12,110,422 granted on 2024-10-08
US20240101867A1
Chemistry; metallurgy

Polishing method and polishing composition

#6 | 2024-02-15
US20240052203A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

#7 | 2024-02-08 ✅ Patent 12,258,492 granted on 2025-03-25
US20240043720A1
Chemistry; metallurgy

Polishing composition, polishing method, and method for manufacturing substrate

#8 | 2024-01-04
US20240002697A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

#9 | 2023-11-16
US20230364732A1
Performing operations; transporting

POLISHING AND CLEANING METHOD, CLEANER AND POLISHING CLEANING SET

#10 | 2023-10-05 ✅ Patent 12,516,276 granted on 2026-01-06
US20230313080A1
Chemistry; metallurgy

SURFACE TREATMENT COMPOSITION

#11 | 2023-10-05
US20230313070A1
Chemistry; metallurgy

COMPOSITION FOR SURFACE TREATMENT, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

#12 | 2023-10-05 ✅ Patent 12,404,475 granted on 2025-09-02
US20230313069A1
Chemistry; metallurgy

SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

#13 | 2023-09-21 ✅ Patent 12,448,544 granted on 2025-10-21
US20230295465A1
Chemistry; metallurgy

CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

#14 | 2022-11-03 ✅ Patent 12,590,225 granted on 2026-03-31
US20220348791A1
Chemistry; metallurgy

POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING POLISHED SUBSTRATE

#15 | 2022-10-13 ✅ Patent 12,031,015 granted on 2024-07-09
US20220325076A1
Chemistry; metallurgy

Quaternary ammonium-based surface modified silica, compositions, methods of making, and methods of use thereof

#16 | 2022-10-06 ✅ Patent 11,999,877 granted on 2024-06-04
US20220315800A1
Chemistry; metallurgy

Silicon nitride chemical mechanical polishing slurry with silicon nitride removal rate enhancers and methods of use thereof

#17 | 2022-06-16
US20220186102A1
Chemistry; metallurgy

FILLER, MOLDED BODY, AND HEAT DISSIPATING MATERIAL

#18 | 2022-03-03 ✅ Patent 12,378,437 granted on 2025-08-05
US20220064486A1
Chemistry; metallurgy

POLISHING COMPOSITION, CONCENTRATED LIQUID THEREOF, AND POLISHING METHOD USING THE SAME

#19 | 2022-02-24 ✅ Patent 12,503,403 granted on 2025-12-23
US20220055951A1
Chemistry; metallurgy

COATED PARTICLE, DISPERSION SOLUTION AND MOLDED BODY CONTAINING SAME, AND SINTERED BODY FORMED USING SAME

#20 | 2022-02-24 ✅ Patent 11,992,914 granted on 2024-05-28
US20220055180A1
Performing operations; transporting

Polishing composition, polishing method, and method for producing substrate

#21 | 2022-01-27 ✅ Patent 12,264,265 granted on 2025-04-01
US20220025213A1
Chemistry; metallurgy

Concentrated liquid of polishing composition and polishing method using same

#22 | 2022-01-20 ✅ Patent 11,773,292 granted on 2023-10-03
US20220017782A1
Chemistry; metallurgy

Polishing composition

#23 | 2021-12-09 ✅ Patent 11,814,294 granted on 2023-11-14
US20210380419A1
Chemistry; metallurgy

Method of producing anionically modified colloidal silica

#24 | 2021-09-30 ✅ Patent 12,077,680 granted on 2024-09-03
US20210301174A1
Chemistry; metallurgy

Polishing composition, production method of the same, polishing method and a manufacturing method of a semiconductor substrate

#25 | 2021-03-18
US20210079264A1
Chemistry; metallurgy

POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

#26 | 2021-03-11 ✅ Patent 11,447,660 granted on 2022-09-20
US20210071036A1
Chemistry; metallurgy

Polishing composition

#27 | 2021-01-28 ✅ Patent 11,518,911 granted on 2022-12-06
US20210024780A1
Chemistry; metallurgy

Polishing composition, manufacturing method of polishing composition, polishing method, and manufacturing method of semiconductor substrate

#28 | 2021-01-21
US20210017423A1
Chemistry; metallurgy

POLISHING COMPOSITION

#29 | 2021-01-07
US20210005462A1
Electricity

SURFACE TREATMENT COMPOSITION, METHOD FOR PRODUCING SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE

#30 | 2020-09-24
US20200303198A1
Electricity

POLISHING COMPOSITION AND POLISHING METHOD

#31 | 2020-04-16 ✅ Patent 11,060,051 granted on 2021-07-13
US20200115661A1
Chemistry; metallurgy

Composition for rinsing or cleaning a surface with ceria particles adhered

#32 | 2020-04-02 ✅ Patent 11,434,391 granted on 2022-09-06
US20200102477A1
Chemistry; metallurgy

Polishing composition, polishing method, and method of producing substrate

#33 | 2020-03-05
US20200071567A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING SYSTEM

#34 | 2020-02-27 ✅ Patent 11,339,310 granted on 2022-05-24
US20200062997A1
Chemistry; metallurgy

Polishing composition

#35 | 2020-02-20
US20200058482A1
Electricity

METHOD FOR POLISHING SILICON CARBIDE SUBSTATE

#36 | 2020-02-13 ✅ Patent 10,988,636 granted on 2021-04-27
US20200048497A1
Chemistry; metallurgy

Polishing composition and method for manufacturing same, polishing method, and method for manufacturing substrate

#37 | 2019-09-26
US20190292405A1
Chemistry; metallurgy

SLURRIES FOR CHEMICAL MECHANICAL POLISHING OF COBALT CONTAINING SUBSTRATES

#38 | 2019-05-16 ✅ Patent 10,570,322 granted on 2020-02-25
US20190144728A1
Chemistry; metallurgy

Polishing composition

#39 | 2019-04-18 ✅ Patent 10,858,543 granted on 2020-12-08
US20190112504A1
Chemistry; metallurgy

Anti-corrosion polishing composition

#40 | 2019-03-21 ✅ Patent 10,876,082 granted on 2020-12-29
US20190085270A1
Chemistry; metallurgy

Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate

#41 | 2018-05-10 ✅ Patent 10,570,315 granted on 2020-02-25
US20180127618A1
Chemistry; metallurgy

Buffered slurry formulation for cobalt CMP

#42 | 2017-04-20 ✅ Patent 10,562,783 granted on 2020-02-18
US20170107115A1
Chemistry; metallurgy

Processing of alumina

#43 | 2015-02-12 ✅ Patent 9,284,472 granted on 2016-03-15
US20150044872A1
Chemistry; metallurgy

SiCN and SiN polishing slurries and polishing methods using the same

#44 | 2014-08-28 ✅ Patent 9,576,818 granted on 2017-02-21
US20140243250A1
Electricity

Polishing slurry for cobalt removal

#45 | 2013-12-05 ✅ Patent 9,662,763 granted on 2017-05-30
US20130324015A1
Performing operations; transporting

Polishing composition

#46 | 2013-08-08 ✅ Patent 9,117,761 granted on 2015-08-25
US20130203254A1
Electricity

Polishing composition and polishing method

#47 | 2013-06-06
US20130139445A1
Performing operations; transporting

LIQUID FILTRATION METHOD

#48 | 2013-02-14 ✅ Patent 9,340,862 granted on 2016-05-17
US20130040065A1
Chemistry; metallurgy

Powder for thermal spraying

#49 | 2012-02-23
US20120042807A1
Chemistry; metallurgy

POWDER FOR THERMAL SPRAYING AND METHOD FOR FORMING THERMAL-SPRAY DEPOSIT

#50 | 2008-09-04
US20080210665A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD

#51 | 2008-06-05
US20080132156A1
Chemistry; metallurgy

POLISHING COMPOSITION AND POLISHING METHOD

#52 | 2007-08-16 ✅ Patent 7,687,393 granted on 2010-03-30
US20070186486A1
Electricity

Polishing composition and rinse composition

#53 | 2007-08-16
US20070186485A1
Electricity

POLISHING COMPOSITION AND RINSE COMPOSITION

#54 | 2007-05-01 ✅ Patent 7,211,121 granted on 2007-05-01
US10813219
-

Polishing composition

#55 | 2007-05-01 ✅ Patent 7,211,122 granted on 2007-05-01
US10674209
-

Polishing composition and rinse composition

#56 | 2007-03-13 ✅ Patent 7,189,684 granted on 2007-03-13
US10476717
-

Polishing composition and method for forming wiring structure using the same

#57 | 2006-11-28 ✅ Patent 7,141,344 granted on 2006-11-28
US10694012
-

Electrostatic image developer and image-forming process

#58 | 2006-05-30 ✅ Patent 7,052,522 granted on 2006-05-30
US10673767
-

Polishing composition and polishing method using the same

#59 | 2006-01-10 ✅ Patent 6,984,255 granted on 2006-01-10
US10810268
-

Thermal spraying powder and method of forming a thermal sprayed coating using the same

#60 | 2005-03-10 ✅ Patent 7,204,865 granted on 2007-04-17
US20050054203A1
Chemistry; metallurgy

Polishing composition

#61 | 2005-02-01 ✅ Patent 6,849,099 granted on 2005-02-01
US10674318
-

Polishing composition

Also check out FUJIMI INCORPORATED's (Aichi, Japan) applicant profile with 70 patent applications submitted.

AssigneeID:

9348 ⎘