ClassID:

30478

B01D2257/2022 - CPC Classification

Classification description:

Components to be removed; Halogens or halogen compounds; Single element halogens Bromine

Recent Application in this class:
#1
20240342530
2024-10-17

QUARTERNARY AMMONIUM HALIDES FOR TREATING HALOGEN CONTAMINATION

#2
20230322650
2023-10-12

HALON PURIFICATION METHOD

#3
20230219878
2023-07-13

Process for Recovering Oxidation By-Products

#4
20220226685
2022-07-21

Quarternary ammonium halides for treating halogen contamination

#5
20220054972
2022-02-24

Method for removing halogen fluoride, quantitative analysis method for gas component contained in halogen fluoride mixed gas, and quantitative analyzer

#6
20200330918
2020-10-22

Compositions comprising metal organic frameworks for the uptake of compounds and related methods

#7
20200269186
2020-08-27

Methods for treating a flue gas stream using a wet scrubber unit

#8
20200001228
2020-01-02

Methods for treating a flue gas stream using a wet scrubber unit

#9
20180290894
2018-10-11

PROCESS FOR REMOVAL OF BROMINE, IODINE, BROMINE- AND/OR IODINE-CONTAINING COMPOUNDS FROM CHLOROSILANES

#10
20180250628
2018-09-06

SORBENT INJECTION SYSTEM AND METHOD FOR TREATING FLUE GASES

#11
20180028963
2018-02-01

Methods for treating a flue gas stream using a wet scrubber unit

#12
20170341010
2017-11-30

Compositions comprising metal organic frameworks for the uptake of compounds and related methods

#13
20160193566
2016-07-07

Reversible and irreversible chemisorption in nonporous, crystalline hybrid structures

#14
20160038871
2016-02-11

Sorbent compositions for use in a wet scrubber unit

#15
20130125749
2013-05-23

Boosted no-lance injection systems and methods

#16
20120308454
2012-12-06

METHOD FOR REMOVING MERCURY FROM FLUE GASES OF HIGH-TEMPERATURE PLANTS

#17
20080280750
2008-11-13

Catalysts for treating acid and halogen gases and production methods thereof

#18
20070251382
2007-11-01

Separation of light gases from halogens

#19
20070003477
2007-01-04

Purification of a mixture of h2/co by catalysis of the impurities

#20
20050056148
2005-03-17

Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream