ClassID:

44849

B24B49/05 - CPC Classification

Classification description:

Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent involving measurement of the workpiece at the place of grinding during grinding operation including the measurement of a first workpiece already machined and of another workpiece being machined and to be matched with the first one

Recent Application in this class:
#1
20250379058
2025-12-11

Surface Processing of Semiconductor Workpieces

#2
20250025984
2025-01-23

SUBSTRATE POLISHING METHOD, SUBSTRATE POLISHING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM

#3
20240253181
2024-08-01

METHOD OF CREATING RESPONSIVENESS PROFILE OF POLISHING RATE OF WORKPIECE, POLISHING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM

#4
20240198480
2024-06-20

METHOD OF CREATING RESPONSIVE PROFILE OF POLISHING RATE OF WORKPIECE, POLISHING METHOD, AND POLISHING APPARATUS

#5
20240165768
2024-05-23

UNDERLAYER TOPOGRAPHY METAL RESIDUE DETECTION AND OVERPOLISHING STRATEGY

#6
20230360919
2023-11-09

WAFER THINNING METHOD HAVING FEEDBACK CONTROL

#7
20220402094
2022-12-22

Substrate processing method and substrate processing apparatus

#8
20220402087
2022-12-22

Substrate processing method and substrate processing apparatus

#9
20210327718
2021-10-21

Method of helical chamfer machining silicon wafer

#10
20210122002
2021-04-29

Method and grinding machine for fabricating a workpiece comprising a helical groove

#11
20200406422
2020-12-31

Method, apparatus, and system for determining optimum operation recipe for optical film-thickness measuring device

#12
20200258756
2020-08-13

Wafer thinning apparatus having feedback control

#13
20190389031
2019-12-26

Method of identifying trajectory of eddy current sensor, method of calculating substrate polishing progress, method of stopping operation of substrate polishing apparatus, method of regularizing substrate polishing progress, program for executing the same, and non-transitory recording medium that records program

#14
20190240806
2019-08-08

Method for producing bearing components

#15
20190027382
2019-01-24

Substrate polishing apparatus and method

#16
20180099374
2018-04-12

Real time profile control for chemical mechanical polishing

#17
20170190020
2017-07-06

Polishing method and polishing apparatus

#18
20140148081
2014-05-29

Grinding machine and method with improved teaching operation

#19
20130210172
2013-08-15

Wafer thinning apparatus having feedback control and method of using

#20
20120276814
2012-11-01

Automatic selection of reference spectra library