B24B53/02 - CPC Classification Index

#1

20250018525

2025-01-16

CHEMICAL MECHANICAL POLISHING APPARATUS

#2

20240308025

2024-09-19

DRESSING MEMBER

#3

20230153717

2023-05-18

MULTI-LAYER ABRASIVE TOOLS FOR CONCRETE SURFACE PROCESSING

#4

20220410335

2022-12-29

Polishing system with annular platen or polishing pad

#5

20220379433

2022-12-01

POLISHING SYSTEM AND DRESSING DEVICE THEREOF

#6

20200284700

2020-09-10

Planar grinder

#7

20200114487

2020-04-16

Polishing system with support post and annular platen or polishing pad

#8

20200094375

2020-03-26

MULTIPLE ZONE PAD CONDITIONING DISK

#9

20200039030

2020-02-06

Coupling mechanism with spherical bearing, method of determining bearing radius of spherical bearing, and substrate polishing apparatus

#10

20190358772

2019-11-28

Conditioner and chemical mechanical polishing apparatus including the same

#11

20190270180

2019-09-05

Carrier head having abrasive structure on retainer ring

#12

20190247974

2019-08-15

METHOD FOR POLISHING WAFER

#13

20180257195

2018-09-13

Surface grinding method and surface grinding device

#14

20180257112

2018-09-13

Cleaning system for a polishing film

#15

20180099377

2018-04-12

Processing apparatus and processing method for workpiece

#16

20180056477

2018-03-01

Polishing system with annular platen or polishing pad for substrate monitoring

#17

20180021910

2018-01-25

Self-sharpening polishing device with magnetorheological flexible polishing pad formed by dynamic magnetic field and polishing method thereof

#18

20180015590

2018-01-18

CMP apparatus having polishing pad surface property measuring device

#19

20170341203

2017-11-30

Method for microbially dressing a super abrasive tool

#20

20170157742

2017-06-08

Carrier head having abrasive structure on retainer ring

#21

20170120414

2017-05-04

Chemical mechanical polishing system

#22

20160199964

2016-07-14

Method for dressing polishing pads

#23

20160158911

2016-06-09

Method and apparatus for conditioning a polishing pad

#24

20160114459

2016-04-28

Polishing pad cleaning systems employing fluid outlets oriented to direct fluid under spray bodies and towards inlet ports, and related methods

#25

20160023324

2016-01-28

Method of CMP pad conditioning

#26

20150165587

2015-06-18

Carrier head having abrasive structure on retainer ring

#27

20150044950

2015-02-12

Pad conditioning tool having sapphire dressing particles

#28

20140342642

2014-11-20

Method of obtaining a sliding distance distribution of a dresser on a polishing member, method of obtaining a sliding vector distribution of a dresser on a polishing member, and polishing apparatus

#29

20140256236

2014-09-11

Pad conditioning tool

#30

20130295820

2013-11-07

Grinding wheel dressing system

#31

20130065492

2013-03-14

Grinding wheel dressing system

#32

20130059503

2013-03-07

Apparatus for CMP pad conditioning

#33

20120315829

2012-12-13

Method and apparatus for conditioning a polishing pad

#34

20110293905

2011-12-01

Superbrasvie tools containing uniformly leveled superabrasive particles and associated methods

#35

20110189505

2011-08-04

METHOD FOR MANUFACTURING GLASS SUBSTRATE FOR MAGNETIC RECORDING MEDIUM

#36

20110034112

2011-02-10

POLISHING APPARATUS, POLISHING AUXILIARY APPARATUS AND POLISHING METHOD

#37

20100240285

2010-09-23

POLISHING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

#38

20100190418

2010-07-29

LAPPING PLATE-CONDITIONING GRINDSTONE SEGMENT, LAPPING PLATE-CONDITIONING LAPPING MACHINE, AND METHOD FOR CONDITIONING LAPPING PLATE

#39

20090137187

2009-05-28

Diagnostic Methods During CMP Pad Dressing and Associated Systems

#40

20090042494

2009-02-12

PAD CONDITIONER OF SEMICONDUCTOR WAFER POLISHING APPARATUS AND MANUFACTURING METHOD THEREOF

#41

20080233842

2008-09-25

Dresser and apparatus for chemical mechanical polishing and method of dressing polishing pad

#42

20070281592

2007-12-06

Vacuum-assisted pad conditioning system

#43

20070218821

2007-09-20

CMP pad conditioner

#44

20070021041

2007-01-25

Dressing method in vertical duplex-head surface grinding machine

#45

20060237395

2006-10-26

Truing method for grinding wheel

#46

20060143991

2006-07-06

Chemical mechanical polishing pad dresser

#47

20060111021

2006-05-25

Semiconductor wafer grinder

#48

20060057940

2006-03-16

Polishing apparatus and method for producing semiconductors using the apparatus

#49

20050176350

2005-08-11

Semiconductor wafer grinder

#50

20050113009

2005-05-26

Polishing pad conditioner and chemical mechanical polishing apparatus having the same

#51

20050070209

2005-03-31

Method and system for controlling the chemical mechanical polishing by using a sensor signal of a pad conditioner

#52

19191269

2025-10-28

Grinding wheel dressing tool with hollow spheres

#53

15279645

2017-10-31

Method to shape the surface of chemical mechanical polishing pads