ClassID:

44999

B24D3/26 - CPC Classification

Classification description:

Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic; Rubbers synthetic or natural for porous or cellular structure

Recent Application in this class:
#1
20190247980
2019-08-15

Grindstone

#2
20190009339
2019-01-10

Super hard constructions and methods of making same

#3
20150059253
2015-03-05

Polishing pad

#4
20120279138
2012-11-08

Polishing pad and a method for manufacturing the same

#5
20110000141
2011-01-06

Polishing pad, the use thereof and the method for manufacturing the same

#6
20100029185
2010-02-04

Polishing pad and a method for manufacturing the same

#7
20100029182
2010-02-04

Polishing pad

#8
20100015893
2010-01-21

Polishing pad

#9
20100009611
2010-01-14

METHOD FOR MANUFACTURING A POLISHING PAD

#10
20100003896
2010-01-07

Polishing pad

#11
20090264050
2009-10-22

High porosity abrasive articles and methods of manufacturing same

#12
20090258588
2009-10-15

Chemical mechanical planarization pad with void network

#13
20080293345
2008-11-27

Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives

#14
20080153395
2008-06-26

Chemical mechanical polishing pad

#15
20080066387
2008-03-20

Abrasive Articles with Novel Structures and Methods for Grinding

#16
20070254567
2007-11-01

Foam buffing pad with random or strategically placed collapsed cell structures

#17
20070214592
2007-09-20

PAD, SYSTEM AND METHOD FOR POLISHING, BUFFING, COMPOUNDING AND GLAZING

#18
20070015444
2007-01-18

SMOOTHING PAD FOR BARE SEMICONDUCTOR WAFERS

#19
20060211342
2006-09-21

Abrasive articles with novel structures and methods for grinding

#20
20060160476
2006-07-20

Porous abrasive articles with agglomerated abrasives

#21
20060154579
2006-07-13

Thermoplastic chemical mechanical polishing pad and method of manufacture

#22
20060113705
2006-06-01

Method of manufacturing polishing pad

#23
20050266226
2005-12-01

Chemical mechanical polishing pad and method for selective metal and barrier polishing

#24
20050262773
2005-12-01

Flexible abrasive product and method of making and using the same

#25
20050255802
2005-11-17

Grinding member

#26
20050101225
2005-05-12

Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives

#27
20050098540
2005-05-12

Polishing pad comprising biodegradable polymer

#28
20050095865
2005-05-05

Selective chemical-mechanical polishing properties of a cross-linked polymer and specific applications therefor

#29
20050079806
2005-04-14

Polishing pad

#30
20050055885
2005-03-17

Polishing pad for chemical mechanical polishing

#31
20050020190
2005-01-27

Flexible abrasive product and method of making and using the same

#32
20050020189
2005-01-27

Flexible abrasive product and method of making and using the same