45003 ⎘
Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic; Resins or natural or synthetic macromolecular compounds for porous or cellular structure
CMP POLISHING PAD
#2POLISHING PAD AND WAFER POLISHING METHOD
#3CMP POLISHING PAD
#4DUAL-CURE RESIN FOR PREPARING CHEMICAL MECHANICAL POLISHING PADS
#5CMP PAD HAVING ULTRA EXPANDED POLYMER MICROSPHERES
#6HOLLOW MICROBALLOONS
#7FIXED ABRASIVE ARTICLES AND METHODS OF FORMING SAME
#8TOOL FOR POLISHING GLASS, METHOD FOR MANUFACTURING GLASS-POLISHING TOOL, AND METHOD FOR POLISHING GLASS
#9CMP polishing pad with window having transparency at low wavelengths and material useful in such window
#10CHEMICAL-MECHANICAL POLISHING SUBPAD HAVING POROGENS WITH POLYMERIC SHELLS
#11OFFSET PORE POROMERIC POLISHING PAD
#12Pore inducer and porous abrasive form made using the same
#13Chemical planarization
#14Method for manufacturing cutting blade, and cutting blade
#15Nonwoven abrasive articles and methods of making the same
#16Shaped vitrified abrasive agglomerate, abrasive articles, and method of abrading
#17BONDED ABRASIVE ARTICLES AND METHODS OF MANUFACTURE
#18Grindstone
#19Polishing body and manufacturing method therefor
#20NONWOVEN ABRASIVE ARTICLE INCLUDING ABRASIVE PARTICLES
#21Pore inducer and porous abrasive form made using the same
#22POROUS MATERIAL FOR POLISHING AND POLISHING TOOL HAVING THE SAME
#23UV CURABLE CMP POLISHING PAD AND METHOD OF MANUFACTURE
#24Super hard constructions and methods of making same
#25Polishing table and polishing apparatus having ihe same
#26Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
#27Porous polyurethane polishing pad and process for preparing a semiconductor device by using the same
#28METHOD FOR MANUFACTURING CUTTING BLADE, AND CUTTING BLADE
#29Polishing pad and polishing apparatus
#30Bonded abrasive articles and methods of manufacture
#31Method of making an abrasive article and abrasive article
#32Polishing pad and process for producing same
#33Controlled-viscosity CMP casting method
#34Method of manufacturing a UV curable CMP polishing pad
#35Nonwoven abrasive articles and methods of making the same
#36Polishing material for polishing hard surfaces, media including the material, and methods of forming and using same
#37Polishing pad having porogens with liquid filler
#38Resin Bonded Abrasive
#39POLYUREA-BASED MATERIAL, POLISHING AND GRINDING MEDIA INCLUDING THE POLYUREA-BASED MATERIAL, AND METHODS OF FORMING AND USING SAME
#40Abrasive wheels and methods for making and using same
#41Method of manufacturing chemical mechanical polishing layers
#42Methods and materials for making a monolithic porous pad cast onto a rotatable base
#43HIGH POROSITY ABRASIVE ARTICLES AND METHODS OF MANUFACTURING SAME
#44Coated abrasive article including a non-woven material
#45Polishing pad and method for making the same
#46Polishing pad
#47POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
#48Polyurethane foam article
#49Method and materials for making a monolithic porous pad cast onto a rotatable base
#50Bonded abrasive tool and method of forming
#51Method for manufacturing polishing pad
#52POLISHING PAD AND METHOD OF MANUFACTURING THE SAME
#53FLOOR GRINDING AND CLEANING BODY
#54Nonwoven abrasive wheel
#55Polishing pad
#56Polishing pad, method of producing the same and method of producing semiconductor device by using the same
#57FLOOR GRINDING AND CLEANING BODY
#58Bonded abrasive tool and method of forming
#59Resin bonded abrasive
#60GLASS SUBSTRATE FOR MAGNETIC DISK AND METHOD FOR PRODUCING THE SAME
#61Method of making polyurethane foam
#62Method for manufacturing polishing pad
#63Method for manufacturing polishing pad
#64Polishing pad, manufacturing method thereof and polishing method
#65GRINDING DISK HAVING PLANT SEED CAPSULES AS A FILLER AND METHOD FOR THE PRODUCTION THEREOF
#66Methods and materials for making a monolithic porous pad cast onto a rotatable base
#67Polishing pad
#68Method for the production of abrasive foams
#69Chemical Mechanical Planarization Pad With Surface Characteristics
#70Polyurethane foam and polishing pad
#71Multi-functional polishing pad
#72Bonded abrasive tool and method of forming
#73Rigid or flexible, macro-porous abrasive article
#74Glass substrate for magnetic disk and method for producing the same
#75Process for producing polyurethane foam
#76Polishing pad, and method for manufacturing polishing pad
#77Polishing pad
#78Synthetic grinding stone
#79Chemical mechanical polishing pad
#80High porosity superabrasive resin products and method of manufacture
#81Polishing pad
#82Chemical Mechanical Polishing Pads Comprising Liquid Organic Material Encapsulated in Polymer Shell and Methods For Producing The Same
#83Self-bonded foamed abrasive articles and machining with such articles
#84Coated Abrasive Disk Comprising A Loop Fabric Layer and Preparation Thereof
#85Method for producing glass substrate for magnetic disk
#86High porosity abrasive articles and methods of manufacturing same
#87Composite sheet for mounting a workpiece and the method for making the same
#88Polishing sheet and manufacturing method of elastic plastic foam sheet
#89ABRASIVE CLEANING ITEM CONTAINING AN AGENT WHICH PROMOTES THE CREATION OF FOAM WHEN IN CONTACT WITH WATER TO TREAT SURFACES
#90Polishing pad
#91METHOD FOR MANUFACTURING POLISHING PAD
#92Polishing pad
#93Polishing pad
#94POLISHING PAD, METHOD OF PRODUCING THE SAME AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE BY USING THE SAME
#95Dental polishing article which contains spherical resin particles
#96Three-dimensional network for chemical mechanical polishing
#97Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives
#98Composite sheet for mounting a workpiece and the method for making the same
#99Polishing Pad and Method for Making the Same
#100Fast break-in polishing pad and a method of making the same
#101PROCESS FOR PREPARING A POLYURETHANE UREA POLISHING PAD
#102SINGLE-LAYER POLISHING PAD
#103Abrasive Articles with Novel Structures and Methods for Grinding
#104Method for manufacturing microporous CMP materials having controlled pore size
#105LOW FRICTION PLANARIZING/POLISHING PADS AND USE THEREOF
#106Method of forming a chemical mechanical polishing pad utilizing laser sintering
#107Three-dimensional network for chemical mechanical polishing
#108POLISHING SHEET AND POLISHING WORK METHOD
#109CMP porous pad with component-filled pores
#110Method of cleaning a probe
#111Hardened porous polymer chemical mechanical polishing (CMP) pad
#112Flexible abrasive article and methods of making and using the same
#113Lapping plate resurfacing abrasive member and method
#114Abrasive tool
#115Polyurethane Urea Polishing Pad with Window
#116Methods and materials for making a monolithic porous pad cast onto a rotatable base
#117Single-layer polishing pad and method of producing the same
#118POLISHING PAD AND METHOD OF MAKING SAME
#119Abrasive articles with novel structures and methods for grinding
#120Water-based polishing pads and methods of manufacture
#121Polishing pad
#122Porous abrasive articles with agglomerated abrasives
#123Polyurethane urea polishing pad
#124Polyurethane urea polishing pad
#125Method for manufacturing microporous CMP materials having controlled pore size
#126POLISHING PAD AND METHOD OF MAKING SAME
#127Cleaning sheet and method for a probe
#128Transparent microporous materials for CMP
#129Surface textured microporous polishing pads
#130Flexible abrasive product and method of making and using the same
#131Integral polishing pad and manufacturing method thereof
#132Grinding member
#133Single-layer polishing pad and method producing the same
#134Fixed abrasive grinding/polishing tool
#135Polishing pad and method of manufacturing semiconductor devices
#136Foamed polishing sheet
#137Polymeric polishing pad having continuously regenerated work surface
#138Polishing pad and method of making same
#139CMP porous pad with component-filled pores
#140Multi-layer polishing pad material for CMP
#141Polishing pad for use in chemical/mechanical planarization of semiconductor wafers having a transparent window for end-point determination and method of making
#142Abrasive body and method of manufacturing the same
#143Process for producing polyurethane grinding tool
#144Polishing sheet and manufacturing method of elastic plastic foam sheet
#145Porous abrasive articles with agglomerated abrasives and method for making the agglomerated abrasives
#146Polishing pad for use in chemical - mechanical palanarization of semiconductor wafers and method of making same
#147Low friction planarizing/polishing pads and use thereof
#148Method of centerless grinding
#149Porous polyurethane polishing pads
#150Flexible abrasive product and method of making and using the same
#151Flexible abrasive product and method of making and using the same