84054 ⎘
Subject matter not provided for in other groups of this subclass; Manufacturing logistics Process control; Yield prediction
Atomic-scale e-beam sculptor
#2MEMS manufacturing system and MEMS manufacturing method
#3Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus
#4Plasma health determination in semiconductor substrate processing reactors
#5MEMS manufacturing method and MEMS manufacturing apparatus
#6SYSTEM AND METHOD FOR CHARACTERIZING CRITICAL PARAMETERS RESULTING FROM A SEMICONDUCTOR DEVICE FABRICATION PROCESS
#7Device manufacturing method and device manufacturing apparatus
#8Method for adaptive feedback controlled polishing
#9Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
#10Etching apparatus and methods
#11Micro-electro-mechanical structure (MEMS) capacitor devices, capacitor trimming thereof and design structures
#12Cavity process etch undercut monitor
#13Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
#14Electrochemical Fabrication Methods for Producing Multilayer Structures Including the use of Diamond Machining in the Planarization of Deposits of Material
#15System for measuring a shape, method for measuring a shape, and computer program product
#16Differential critical dimension and overlay metrology apparatus and measurement method
#17Method and Apparatus for Maintaining Parallelism of Layers and/or Achieving Desired Thicknesses of Layers During the Electrochemical Fabrication of Structures
#18Trench depth monitor for semiconductor manufacturing
#19DIGITAL LITHOGRAPHY USING REAL TIME QUALITY CONTROL
#20Electrochemical Fabrication Methods for Producing Multilayer Structures Including the use of Diamond Machining in the Planarization of Deposits of Material
#21Methods of making a MEMS device by monitoring a process parameter
#22Method and device for wafer backside alignment overlay accuracy
#23Metrology structure and methods
#24Method and apparatus for monitoring a microstructure etching process
#25Method And Apparatus For Monitoring Plasma Conditions In An Etching Plasma Processing Facility
#26Method for quantifying over-etch of a conductive feature
#27MEMS device wafer-level package
#28Systems and methods for mixing reactants
#29Wet etch processing
#30APPARATUS AND METHOD FOR DETECTING AN ENDPOINT IN A VAPOR PHASE ETCH
#31Differential critical dimension and overlay metrology apparatus and measurement method
#32Digital lithography using real time quality control
#33Method and apparatus for monitoring plasma conditions in an etching plasma processing facility
#34Systems and methods for mixing reactants
#35Metrology structure and methods
#36MEMS device wafer-level package
#37High throughput screening of crystallization of materials
#38Method for modifying existing micro-and nano-structures using a near-field scanning optical microscope
#39Capacitive measurement method and system for nanoimprint process monitoring
#40Electrochemical fabrication methods for producing multilayer structures including the use of diamond machining in the planarization of deposits of material
#41Microdevice processing systems and methods
#42Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
#43Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
#44High-precision feedback control for ion sculpting of solid state features
#45Method and processing system for monitoring status of system components
#46Thin film resistor etch