ClassID:

86973

C03B19/1484 - CPC Classification

Classification description:

Other methods of shaping glass by gas- or vapour- phase reaction processes Means for supporting, rotating or translating the article being formed

Sub-classes:
Recent Application in this class:
#1
20250145514
2025-05-08

ELECTROSTATIC CLAMPING OF ELECTRICALLY INSULATING SUBSTRATES

#2
20220127181
2022-04-28

Manufacturing apparatus and manufacturing method of porous glass base material

#3
20180079674
2018-03-22

Method for producing an optical blank from synthetic quartz glass

#4
20130115391
2013-05-09

High purity synthetic silica and items such as semiconductor jigs manufactured therefrom

#5
20110072852
2011-03-31

Method for the production of a cylinder made from quartz glass using a retaining device, and retaining device

#6
20100107696
2010-05-06

METHOD FOR REDUCING INCLUSIONS IN SILICA-TITANIA GLASS

#7
20090324817
2009-12-31

Method for producing a cylinder of quartz glass and holding device for carrying out the method

#8
20090288448
2009-11-26

Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate

#9
20090242387
2009-10-01

PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2

#10
20090183526
2009-07-23

Method for producing a semifinished product from synthetic quartz glass

#11
20090143213
2009-06-04

Low expansion glass material having low expansivity gradient

#12
20070271964
2007-11-29

Method and Device for Producing a Hollow Quartz-Glass Cylinder

#13
20070263281
2007-11-15

Reduced striae low expansion glass and elements, and a method for making same

#14
20070214834
2007-09-20

Method for Producing a Hollow Cylinder From Synthetic Quartz Glass, Using a Retaining Device

#15
20070207911
2007-09-06

PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2

#16
20070137252
2007-06-21

Reduced striae low expansion glass and elements, and a method for making same

#17
20070134566
2007-06-14

Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate

#18
20070059534
2007-03-15

Method for producing a semifinished product for an optical component of high homogeneity

#19
20060236724
2006-10-26

Mandrel for producing quartz glass and production method for optical fiber mother material, optical fiber and quartz glass body using the same

#20
20060144094
2006-07-06

Method for the production of a hollow cylinder made of synthetic quartz glass with the aid of a holding device, and appropriate holding device for carrying out said method

#21
20060141142
2006-06-29

Multilayered optical structures

#22
20050245383
2005-11-03

Silica glass containing TiOand optical material for EUV lithography

#23
20050241338
2005-11-03

Reduced striae extreme ultraviolet elements

#24
20050097923
2005-05-12

System and support rod assembly for sintering fiber optic sleeve tubes