87789 ⎘
Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties specially adapted for use as photomask
REFLECTIVE MASK BLANK, REFLECTIVE MASK, REFLECTIVE MASK MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#2MULTILAYERED-REFLECTIVE-FILM-PROVIDED SUBSTRATE, REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#3Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#4Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#5Blank for mold production and method for manufacturing mold
#6Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#7Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
#8Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
#9Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same
#10METHOD OF PROCESSING GLASS SUBSTRATE SURFACE
#11Process for smoothing surface of glass substrate
#12Multilayer Coatings For EUV Mask Substrates
#13Reflective mask blank, reflective mask, and method of manufacturing semiconductor device
#14Method for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography
#15Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
#16Photomasks including multi-layered light-shielding and methods of manufacturing the same
#17Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask
#18Multilayer reflective film coated substrate, manufacturing method thereof, reflective mask blank, and reflective mask
#19Method for adjusting dimensions of photomask features
#20Reflective-type mask blank for EUV lithography and method for producing the same
#21Mask blank and process for producing and process for using the same, and mask and process for producing and process for using the same
#22Substrate with a multilayer reflection film, reflection type mask blank for exposure, reflection type mask for exposure and methods of manufacturing them
#23Dual-layer EUV mask absorber with trenches having opposing sidewalls that are straight and parallel
#24Method for adjusting dimensions of photomask features
#25Multilayer coatings for EUV mask substrates