87970 ⎘
Glass compositions; Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
OPTICAL GLASS WITH HIGH REFRACTIVE INDEX
#2SILICOBORATE AND BOROSILICATE GLASSES HAVING HIGH REFRACTIVE INDEX AND HIGH TRANSMITTANCE TO BLUE LIGHT
#3TITANIA-SILICA GLASS WITH PLURALITY OF COMPOSITIONAL VARIATION SECTIONS
#4TITANIA-SILICA GLASS WITH REDUCED HYDROXYL AND HALIDE CONCENTRATIONS AND METHODS OF MAKING
#5Silicoborate and borosilicate glasses having high refractive index and high transmittance to blue light
#6Material and Process for Fabricating and Shaping of Transparent Multicomponent Fused Silica Glasses
#7OPTICAL GLASS, OPTICAL ELEMENT, OPTICAL SYSTEM, CEMENTED LENS, INTERCHANGEABLE CAMERA LENS, MICROSCOPE OBJECTIVE LENS, AND OPTICAL DEVICE
#8TUBE GLASS, PRIMARY PACKAGING CONTAINER FOR PHARMACEUTICAL PREPARATIONS, AND ALKALI SILICATE GLASS
#9METHOD FOR OPTIMIZING PROPERTY PROFILES IN SOLID SUBSTRATE PRECURSORS
#10GLASSES HAVING HIGH FRACTURE TOUGHNESS
#11Low Inclusion TiO2-SiO2 Glass Obtained by Hot Isostatic Pressing
#12METHOD FOR PRODUCING GLASS SUBSTRATE
#13Titanium-containing quartz glass having excellent UV absorption, and method for producing same
#14Silicoborate and borosilicate glasses having high refractive index and high transmittance to blue light
#15Glass substrate for EUVL, manufacturing method thereof, mask blank for EUVL, and manufacturing method thereof
#16OPTICAL GLASS WITH LOW DENSITY
#17Substrate for a reflective optical element
#18CHEMICALLY RESISTANT BORON- AND ALKALI-FREE GLASSES
#19High index glasses
#20CHEMICALLY TEMPERABLE, CORROSION-STABLE GLASSES
#21Low melting point glass composition excellent in water resistance
#22Glasses having high fracture toughness
#23FIBERGLASS CONTAINING COMPOSITES WITH IMPROVED RETAINED GLASS FIBER LENGTH, IMPACT STRENGTH, AND TENSILE PROPERTIES
#24Glass composition
#25Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#26Near infrared shielding and laser-resistant window
#27High aspect ratio glass wafer
#28Glass fiber composition, glass fiber and composite material therefrom
#29Cover glass lamination structure and manufacturing method thereof
#30DOPED NANOPOROUS SILICA
#31Glass composite for use in extreme ultra violet lithography
#32Device for manufacturing SiO-TiObased glass
#33ULTRALOW EXPANSION GLASS
#34METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT
#35Doped ultra-low expansion glass and methods for annealing the same
#36Titania-doped quartz glass and making method
#37Ultralow expansion glass
#38Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#39Fused quartz tubing for pharmaceutical packaging
#40Mirror blank for EUV lithography without expansion under EUV radiation
#41Titania-doped quartz glass and making method
#42METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT
#43Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith
#44Method for producing a glass ceramic element with patterned coating
#45METHOD OF FINISHING PRE-POLISHED GLASS SUBSTRATE SURFACE
#46Doped ultra-low expansion glass and methods for making the same
#47Doped silica-titania glass having low expansivity and methods of making the same
#48High hydroxyl TiO-SiOglass
#49Method for producing a blank of fluorine-doped and titanium-doped glass having a high silicic-acid content and a blank produced according to the method
#50Method for the manufacture of doped quartz glass
#51Blank of TiO-SiOglass for a mirror substrate for use in EUV lithography and method for the production thereof
#52Blank made of titanium-doped silica glass and method for the production thereof
#53Method for producing titanium-doped synthetic quartz glass
#54Boron-doped titania-silica glass having very low CTE slope
#55Low expansion silica-titania articles with a Tgradient by compositional variation
#56Manufacturing method for SiO-TiObased glass and manufacturing method for photomask substrate made of SiO-TiObased glass
#57Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof
#58Manufacturing method for SiO—TiObased glass, manufacturing method for plate-shaped member made of SiO—TiObased glass, manufacturing device, and manufacturing device for SiO—TiObased glass
#59Ultralow expansion glass
#60Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
#61Glass sheet with high energy transmission
#62EUV lithography member, making method, and titania-doped quartz glass
#63Very low CTE slope doped silica-titania glass
#64Niobium doped silica titania glass and method of preparation
#65Substrates for mirrors for EUV lithography and their production
#66Titania-doped quartz glass and making method
#67Substrate for EUVL optical member
#68Titania doped quartz glass and making method
#69SILICA GLASS CONTAINING TIO2
#70METHOD FOR PRODUCING SILICA-BASED GLASS SUBSTRATE FOR IMPRINT MOLD, AND METHOD FOR PRODUCING IMPRINT MOLD
#71Blank of titanium-doped glass with a high silica content for a mirror substrate for use in EUV lithography and method for the production thereof
#72TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
#73Method for producing TiO-SiOglass body, method for heat-treating TiO-SiOglass body, TiO-SiOglass body, and optical base for EUVL
#74Titania-doped quartz glass member and making method
#75Titania-doped quartz glass and making method
#76Optical filter material made of gallium-doped quartz glass, filter component and method for irradiation by means of a UV radiation source
#77Process for producing porous quartz glass object, and optical member for EUV lithography
#78Synthetic quartz glass substrate and making method
#79Low expansivity, high transmission titania doped silica glass
#80Process for production of synthetic quartz glass
#81Titania and sulfur co-doped quartz glass member and making method
#82Method for manufacturing grin lens
#83TIO2-CONTAINING QUARTZ GLASS SUBSTRATE
#84TiO-containing silica glass for optical member for EUV lithography
#85TiO-containing silica glass and optical member for EUV lithography using the same
#86TiO-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
#87TiO-containing silica glass
#88TiO2-containing quartz glass substrate
#89PROCESS FOR PREPARING HIGH-PURITY SILICON DIOXIDE GRANULE
#90Optical member comprising TiO-containing silica glass
#91Substrate for EUV mask blanks
#92Titania-doped quartz glass member and making method
#93Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate
#94PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2
#95Low expansion glass material having low expansivity gradient
#96Silica glass containing TiOand process for its production
#97Processing method of glass substrate, and highly flat and highly smooth glass substrate
#98Titania-doped quartz glass for nanoimprint molds
#99Quartz glass blank and method for producing said blank
#100Functionalized Sol-Gel Material, Sol-Gel Film Derived Therefrom, and Method for Preparing the Same
#101Silica glass and optical material
#102Silica glass containing TiOand process for its production
#103Titania-silica glass
#104Ultra low expansion glass and methods for making
#105Reduced striae low expansion glass and elements, and a method for making same
#106PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2
#107Reduced striae low expansion glass and elements, and a method for making same
#108Titania-doped quartz glass and making method, EUV lithographic member and photomask substrate
#109Method and apparatus for making fused silica
#110Silica glass containing TiOand process for its production
#111Doped silica glass articles and methods of forming doped silica glass boules and articles
#112Electric lamp comprising aluminum oxide and cerium oxide
#113Silica glass
#114Adjusting expansivity in doped silica glasses
#115Electrodeless lamp for emitting ultraviolet and/or vacuum ultraviolet radiation
#116Functionalized sol-gel material, sol-gel film derived therefrom, and method for preparing the same
#117Silica glass containing TiOand process for its production
#118Silica glass containing TiOand optical material for EUV lithography
#119Silica glass containing TiOand process for its production
#120Reduced striae extreme ultraviolet elements
#121SiO-TiOglass body with improved resistance to radiation
#122Fluorine-doped silicate glass and use thereof
#123Doped silica glass articles and methods of forming doped silica glass boules and articles