ClassID:

92304

C07C2103/92 - CPC Classification

Classification description:

Recent Application in this class:
#1
20180265460
2018-09-20

Method of forming paracyclophane containing functional group with disulfide bond

#2
20170166520
2017-06-15

Chemical film on substrate and method of forming the same, method of forming paracyclophane containing functional ground with disulfide bond

#3
20160368849
2016-12-22

Process for the high-yield preparation of P-(R)calix[9-20]arenes

#4
20160259247
2016-09-08

Composition for forming a resist underlayer film, and pattern-forming method

#5
20150376122
2015-12-31

Poly-cyanostilbene macrocycles

#6
20150286136
2015-10-08

Resist composition

#7
20150218067
2015-08-06

Catalytic or photocatalytic preparation method of parylene AF4

#8
20150185613
2015-07-02

Composition for forming a resist underlayer film, and pattern-forming method

#9
20150152022
2015-06-04

Carbon nanohoops and methods of making

#10
20150072029
2015-03-12

Materials and methods for reduction of protein tau and treatment of neurodegenerative diseases

#11
20150037735
2015-02-05

Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof

#12
20140330012
2014-11-06

Paracyclophane-based ligands, their preparation and use in catalysis

#13
20140329178
2014-11-06

Cyclic compound, method for producing the same, radiation-sensitive composition, and resist pattern formation method

#14
20140221632
2014-08-07

Photocatalytic preparation method of parylene AF4

#15
20140011986
2014-01-09

Catalytic preparation method of parylene AF4

#16
20130245327
2013-09-19

Carbon nanohoops and methods of making

#17
20110028718
2011-02-03

Paracyclophane-based ligands, their preparation and use in catalysis