92968 ⎘
Compounds containing nitrogen atoms doubly-bound to a carbon skeleton containing imino groups having carbon atoms of imino groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of an unsaturated carbon skeleton being acyclic
CONTROLLED RELEASE ORAL PHARMACEUTICAL DOSAGE FORMS COMPRISING MGBG
#2FRAGRANCE AND FLAVOR MATERIALS
#3Cleavable surfactant
#4Method for preparing pyrazolecarboxylic acid derivative, and intermediate thereof
#5Process for preparing substituted pyrazoles containing haloalkoxy- and haloalkylthio groups from alpha,alpha -dihaloalkylamines and ketimines
#6Controlled release oral pharmaceutical dosage forms comprising MGBG
#7Process for the preparation of 4-amino-5-fluoro-3-chloro-6-(substituted)picolinates
#8Synthesis of an antiviral compound
#9PROCESS FOR THE PREPARATION OF 4-AMINO-5-FLUORO-3-CHLORO-6-(SUBSTITUTED)PICOLINATES
#10Process for the preparation of 4-amino-5-fluoro-3-chloro-6-(substituted)picolinates
#11Long chain base sphingosine kinase inhibitors
#12Substituted aminobutyric derivatives as neprilysin inhibitors
#13Precursors for atomic layer deposition
#14Controlled release oral pharmaceutical dosage forms comprising MGBG
#15Self-magnetic metal-salen complex compound
#16Process for the preparation of 4-amino-5-fluoro-3-chloro-6-(substituted)picolinates
#17Process for the preparation of 4-Amino-5-fluoro-3-chloro-6-(substituted)picolinates
#18Method and substances for preparation of N-substituted pyridinium compounds
#19Delayed release oral pharmaceutical dosage forms comprising MGBG
#20Substituted aminobutyric derivatives as neprilysin inhibitors
#21Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
#22Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#23Substituted aminobutyric derivatives as neprilysin inhibitors
#24BETA-DIKETIMINATE PRECURSORS FOR METAL CONTAINING FILM DEPOSITION
#25Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#26Compounds for depositing tellurium-containing films
#27β-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
#28Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#29Atomic layer deposition of tantalum-containing films using surface-activating agents and novel tantalum complexes
#30Unsymmetrical ligand sources, reduced symmetry metal-containing compounds, and systems and methods including same
#31Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same
#32Volatile copper (II) complexes and reducing agents for deposition of copper films by Atomic Layer Deposition
#33Pro-fragrance and pro-flavorant compositions
#34Michael addition product and Schiff's base aromachemicals
#35Volatile copper(II) complexes for deposition of copper films by atomic layer deposition
#36Volatile copper(II) complexes and reducing agents for deposition of copper films by atomic layer deposition
#37Composition comprising amino-imine compounds
#38Volatile copper(II) complexes for deposition of copper films by atomic layer deposition