93343 ⎘
Sulfonic acids; Halides, esters, or anhydrides thereof; Sulfonic acids having sulfo groups bound to acyclic carbon atoms of an acyclic saturated carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton containing doubly-bound nitrogen atoms bound to the carbon skeleton
Cleavable surfactants
#2Cleavable surfactants
#3ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE
#4Salts and photoresists comprising same
#5Cleavable surfactants
#6Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same
#7Radiation-sensitive resin composition, method for forming resist pattern, acid generating agent and compound
#8Cleavable surfactants