Patents-Review.com
ClassID:

93365 ⎘

C07C309/39 - CPC Classification

Classification description:

Sulfonic acids; Halides, esters, or anhydrides thereof; Sulfonic acids having sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing halogen atoms bound to the carbon skeleton

Recent Application in this class:
#1
20250244665
2025-07-31

ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS

 #2
20240152048
2024-05-09

RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD

 #3
20240069442
2024-02-29

Photoacid generator

 #4
20220163886
2022-05-26

Photoacid generator

 #5
20200379353
2020-12-03

Photoresist pattern trimming compositions and pattern formation methods

 #6
20190300491
2019-10-03

Salt of quinazoline derivative, preparation method therefor and application thereof

 #7
20190256719
2019-08-22

Corrosion inhibiting coating additive

 #8
20190010119
2019-01-10

Resist composition and resist patterning process

 #9
20180275512
2018-09-27

Resist composition and patterning process

 #10
20180267403
2018-09-20

Resist composition and patterning process

 #11
20180267402
2018-09-20

Resist composition and patterning process

 #12
20170174516
2017-06-22

Titanium ligand-modified black phosphorus and preparation method and use thereof

 #13
20170123314
2017-05-04

Thermal acid generators and photoresist pattern trimming compositions and methods

 #14
20170038679
2017-02-09

RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID GENERATOR AND COMPOUND

 #15
20160187783
2016-06-30

Photoresist pattern trimming compositions and methods

 #16
20160040013
2016-02-11

Colored composition

 #17
20160016905
2016-01-21

Stilbazolium derivative and nonlinear optical material using the same

 #18
20150057316
2015-02-26

NOVEL SULFONATE-BASED TRIMEBUTINE SALTS

 #19
20120123154
2012-05-17

Method for producing biaryl compound

 #20
20110269066
2011-11-03

Bronsted acid compound, manufacturing method of condensation compound, dispersion liquid of condensation compound particles, manufacturing method of electrostatic image developing toner, manufacturing method of binder resin, binder resin, dispersion liquid of resin particles, electrostatic image developing toner, electrostatic image developer, and image-forming method

 #21
20110218357
2011-09-08

Processes for preparing 4-chlorobenzenesulfonic acid and 4,4′-dichlorodiphenyl sulfone

 #22
20110171577
2011-07-14

Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition

 #23
20100150835
2010-06-17

Synthesis of [18F] Fluoromethyl Benzene Using Benzyl Pentafluorobenzenesulfonate

 #24
20070287088
2007-12-13

Bronsted acid compound, manufacturing method of condensation compound, dispersion liquid of condensation compound particles, manufacturing method of electrostatic image developing toner, manufacturing method of binder resin, binder resin, dispersion liquid of resin particles, electrostatic image developing toner, electrostatic image developer, and image-forming method

 #25
20070125712
2007-06-07

Anion-exchange displacement chromatography process and anionic organic compounds for use as displacer compounds in anion-exchange displacement chromatography process

 #26
20050176982
2005-08-11

Method for producing onium salt derivatives, and novel onium salt derivatives

 #27
20050123859
2005-06-09

Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition