91281 ⎘
Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with at least one hydroxy group on a condensed ring system containing two rings
COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME
#2PHARMACEUTICAL COMPOSITIONS AND METHODS OF ADMINISTRATION
#3Synthesis and Evaluation of Novel (4-Hydroxyphenyl) Substituted Carbocycles as Potent and Selective Estrogen Receptor Beta Agonists
#4Ion channel antagonists/blockers and uses thereof
#53,3,3′,3′-tetramethyl-1,1′-spirobiindane-7,7′-diol
#6BISPHENOL COMPOSITION AND POLYCARBONATE RESIN
#7COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPOUND, AND RESIN
#8NOVEL COMPOUNDS WHICH ACTIVATE ESTROGEN RECEPTORS AND COMPOSITIONS AND METHODS OF USING THE SAME
#9METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COMPOSITION
#10Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate
#11METHOD FOR PURIFYING DIHYDROXYNAPHTHALENE
#12Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method
#13Hardmask composition, method of forming pattern by using the hardmask composition, and hardmask formed using the hardmask composition
#14Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
#15Compounds which activate estrogen receptors and compositions and methods of using the same
#16Resist underlayer film composition, patterning process, and method for forming resist underlayer film
#17Resist underlayer film composition, patterning process, and method for forming resist underlayer film
#18Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
#19Naphthalene-containing polymers and methods of making the same
#20Resist composition, method for forming resist pattern, and polyphenol compound used therein
#21Introduction of alkyl substituents to aromatic compounds
#22Conductive paste and multilayer board using the same
#23Curable composition for permanent resist films, and permanent resist film
#24Phenolic hydroxyl-containing compound, composition containing the same, and cured film of the composition
#25Naphthol-type calixarene compound and method for producing the same, photosensitive composition, resist material, and coating
#26RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
#27Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film
#28Secondary battery
#29STABILITY IMPROVER OF AROMATIC COMPOUND AND METHOD FOR IMPROVING STABILITY OF AROMATIC COMPOUND
#30Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
#31Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
#32Compound containing phenolic hydroxyl group, phenolic resin, curable composition, cured product thereof, semiconductor sealing material, and printed circuit board
#336-HYDROXY-2-NAPHTHALENYL FLUORENE DERIVATIVES AND LENS AND CAMERA MODULE USING THE SAME
#34Resins for underlayers
#35Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
#36Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
#37Multifunctional deoxybenzoin-based monomers and resins having reduced flammability
#38Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
#39Process for asymetric methylallylation in the presence of a 2,2′-substituted 1,1′-BI-2-naphthol catalyst
#40Fluorine-Containing Polymerizable Monomer and Polymer Compound Using Same
#41Method of resolution of (RS)- 1,1′-BI-2-naphthol for obtaining enantiomeric pure I.E. (S)-(−)-1,1′-BI-2-naphthol and/or (R)-(+)-1,1′-BI-2-naphthol via co-crystal formation with optically active derivatives of γ-amino acids
#42Anthracene derivative, compound obtained therefrom, composition, cured product, and process for producing same
#43Method for the hydroxylation of halogenated aryl compounds
#44Naphthalene-based inhibitors of anti-apoptotic proteins
#45Stilbenes and chalcones for the prevention and treatment of cardiovascular diseases
#46Naphthalene-based inhibitors of anti-apoptotic proteins
#47Schwartz reagents: methods of in situ generation and use
#48Flavanoids and isoflavanoids for the prevention and treatment of cardiovascular diseases
#49APOGOSSYPOLONE AND THE USES THEREOF
#50Naphthalene-based inhibitors of anti-apoptotic proteins
#51Process for the preparation of phenolic hydroxy-substituted compounds
#52Stilbenes and chalcones for the prevention and treatment of cardiovascular diseases
#53Flavanoids and isoflavanoids for the prevention and treatment of cardiovascular diseases
#54Apogossypolone and the uses thereof
#55Device for securing valuables
#56Chiral catalyst, process for preparing the same and its use in the oxidate coupling of naphthols
#57Naphthol derivative and charge control agent comprising the same
#58Non-halogenated naphthol compounds, antimicrobial compositions containing the same, and methods of using the same