91923 ⎘
Compounds having carboxyl groups bound to acyclic carbon atoms and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups; Saturated compounds having only one carboxyl group and containing keto groups containing halogen
Photoresist with top-coating photo-decomposable base for photolithography
#2Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound
#3Amphiphilic cyclobutenes and cylobutanes
#4Process for the production of 4-chloroacetoacetyl chloride, 4-chloroacetoacetic acid esters, amides and imides
#5Photodecomposable bases and photoresist compositions
#6Valproic acid analogues and pharmaceutical composition thereof