ClassID:

92061

C07C65/38 - CPC Classification

Classification description:

Compounds having carboxyl groups bound to carbon atoms of six—membered aromatic rings and containing any of the groups OH, O—metal, —CHO, keto, ether, groups, groups, or groups containing keto groups having unsaturation outside the aromatic rings

Recent Application in this class:
#1
20200190010
2020-06-18

Benzene fused heterocyclic derivative and pharmaceutical composition comprising the same

#2
20170247398
2017-08-31

O-phenyl chalcone compounds and uses thereof

#3
20160333033
2016-11-17

O-phenyl chalcone compounds and preparation method and use thereof

#4
20160186103
2016-06-30

Photolabile pro-fragrances

#5
20140110605
2014-04-24

Photolabile pro-fragrances

#6
20130165663
2013-06-27

Method for preparing 5-haloalkyl-4, 5-dihydroisoxazole derivatives

#7
20130096256
2013-04-18

Cross-linker

#8
20120277442
2012-11-01

METHOD FOR PREPARING 5-HALOALKYL-4, 5-DIHYDROISOXAZOLE DERIVATIVES

#9
20110144170
2011-06-16

Fc RECEPTOR MODULATING COMPOUNDS AND COMPOSITIONS

#10
20100249424
2010-09-30

Method for preparing 5-haloalkyl-4,5-dihydroisoxazole derivatives

#11
20100137612
2010-06-03

Method for production of 3-hydroxypropan-1-one compound, method for production of 2-propen-1-one compound and method for production of isoxazoline compound

#12
20090118169
2009-05-07

NOVEL COMPOUNDS AND PHARMACEUTICAL USE THEREOF

#13
20090023923
2009-01-22

1-3-bis(substituted phenyl)-3-hydroxypropan-1-one or 2-propen-1-one compound, and salt thereof

#14
20080213347
2008-09-04

Ligand antagonists of RAR receptors and pharmaceutical/cosmetic applications thereof

#15
20080146632
2008-06-19

Fc receptor modulating compounds and compositions

#16
20060264484
2006-11-23

Fc receptor modulating compounds and compositions

#17
20060122344
2006-06-08

Organometallic fluorenyl compounds, preparations, and use

#18
20050234131
2005-10-20

Ligand antagonists of RAR receptors and pharmaceutical/cosmetic applications thereof

#19
14607998
2015-08-11

Method for bottom-up graphene sheet preparation and bandgap engineering