92184 ⎘
Esters of carboxylic acids; Esters of carbonic or haloformic acids; Halogen-containing esters of unsaturated acids Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
SELF ALIGNMENT AGENT AND LIQUID CRYSTAL COMPOSITION THEREOF
#2RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER
#3ELECTROLYTE, ELECTROCHEMICAL DEVICE, LITHIUM ION SECONDARY BATTERY, AND MODULE
#4Method for Producing Fluorine-Containing Polymer and Composition
#5RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND
#6COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUND, AND METHOD FOR PRODUCING (CO)POLYMER
#7INHIBITORS OF ANTIBIOTIC RESISTANCE MEDIATED BY ARNT
#8Liquid Crystal Mixture and Liquid Crystal Display
#9COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND
#10Electrolyte, electrochemical device, lithium ion secondary battery, and module
#11Compound, resin precursor, cured object, optical element, optical system, interchangeable camera lens, optical device, cemented lens, and method for manufacturing cemented lens
#12Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process
#13Fluorine compounds
#14COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM
#15Polymerizable compound as well as liquid crystal composition and liquid crystal display device each including polymerizable compound
#16HALOGENATED HETEROALKENYL- AND HETEROALKYL-FUNCTIONALIZED ORGANIC COMPOUNDS AND METHODS FOR PREPARING SUCH COMPOUNDS
#17(Meth)acrylate compound, polymer, resist material, and method for producing (meth)acrylate compound
#18RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
#19Method for preparing fluorinated methacrylate compound
#20Calixarene compound and curable composition
#21Method for producing α-fluoro acrylic acid ester, and composition containing highly-pure fluorocyclopropane derivative, and composition containing highly-pure α-fluoro acrylic acid ester
#22Monomer, polymer, resist composition, and patterning process
#23Compound, resin, resist composition and method for producing resist pattern
#24Polymerizable compound, liquid crystal medium containing same and liquid crystal display device
#25Fluorine-containing compound having unsaturated bond, and surface modifier using the same
#26Method for purifying acrylic acid derivative
#27Rapid self-assembled small-sized block polymer material with low quenching temperature and the preparation and application thereof
#28Composition containing acrylic acid derivative, and method for stabilizing acrylic acid derivative
#29Composition
#30Acrylic acid derivative-containing composition, and method for stabilizing acrylic acid derivative
#31Monomers, polymers and photoresist compositions
#32Fluorine compounds
#33Fluorine compounds
#34Production method for alpha-fluoro acrylic acid esters
#35Monomer, polymer, resist composition, and patterning process
#36Reactive monomer, a liquid crystal panel and an electronic equipment
#37Compound, resin and photoresist composition
#38Polymerizable compound, polymerizable composition and liquid crystal display device
#39Salt, resin, resist composition and method for producing resist pattern
#40Compound, resin, resist composition and method for producing resist pattern
#41Compound, resin, resist composition and method for producing resist pattern
#42Compound, resin, resist composition and method for producing resist pattern
#43Polymerizable compound, polymerizable composition and liquid crystal display device
#44Polymerisable compounds and the use thereof in liquid-crystal displays
#45Polymerizable compound having triple bond, liquid crystal composition and liquid crystal display device
#46Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
#47Polymerisable compounds and the use thereof in liquid-crystal media and liquid-crystal displays
#48Monomer, polymer, resist composition, and patterning process
#49Perfluoropolyvinyl modified aryl intermediates/monomers
#50Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
#51Fluorinated monomer, polymer, resist composition, and patterning process
#52Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound
#53Polymerizable tertiary ester compound, polymer, resist composition, and patterning process
#54Polymerizable compound
#55Radiation-sensitive resin composition, method for forming resist pattern, and polymer and compound
#56Process for producing ester compound
#57Reactive monomer of liquid crystal and liquid crystal panel
#58Preparation of substituted 2-fluoroacrylic acid derivatives
#59Fluorinated arylene-containing compounds, methods, and polymers prepared therefrom
#60Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
#61PROCESS FOR THE PREPARATION OF PURE ACRYLATE ESTERS
#62Fluorinated compound and fluorinated polymer
#63Fluorinated compound and fluorinated polymer
#64Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method
#65Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
#66Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foam stabilizers
#67FLUOROCOMPOUND HAVING HIGHLY FLUORINATED NORBORNANE STRUCTURE, FLUOROPOLYMER, AND THEIR PRODUCTION PROCESSES
#68Process for preparation of 2-fluoroacrylic esters
#69Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound
#70Process for producing monomer for fluorinated resist
#71Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt
#72Polymerisable compounds and the use thereof in liquid-crystal media and liquid-crystal displays
#73Fluorinated monomer, polymer, resist composition, and patterning process
#74Acetal compound, polymer, resist composition, and patterning process
#75Synthesis of fluoroalcohol-substituted (meth)acrylate esters and polymers derived therefrom
#76PRODUCTION PROCESSES AND SYSTEMS, COMPOSITIONS, SURFACTANTS, MONOMER UNITS, METAL COMPLEXES, PHOSPHATE ESTERS, GLYCOLS, AQUEOUS FILM
#77Process for producing α-substituted norbornanyl acrylates
#78Hydrofluoroalcohols with improved thermal and chemical stability
#79Polymerizable fluorine-containing compound
#80Trifunctional (meth)acrylate compound and polymerizable composition containing same
#812-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same
#82Processes for production of 2-bromo-2,2-difluoroethanol and 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid salt
#83Process for producing ester compound
#84Method for separation of olefin-alcohol azeotropic mixture
#85Mixture of fluoroalkyl alcohol-unsaturated carboxylic acid derivatives, polymer of the mixture, and water-and oil-repellent containing the polymer as active ingredient
#86Side chain fluorochemicals with crystallizable spacer groups
#87Modified chalcone compounds as antimitotic agents
#88Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
#89Compound and polymeric compound
#90POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION
#91FLUOROUS TELOMERIC COMPOUNDS AND POLYMERS CONTAINING SAME
#92Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
#93Fluorocompound having highly fluorinated norbornane structure, fluoropolymer, and their production processes
#94Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#95Fluoroadamantane derivative, fluorine-containing polymer and production method
#96Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same
#97Production Processes and Systems, Compositions, Surfactants, Monomer Units, Metal Complexes, Phosphate Esters, Glycols, Aqueous Film Forming Foams, and Foam Stabilizers
#98Process for producing a polyfluoroalkyl (meth)acrylate
#99FLUORINE-CONTAINING ADAMANTANE DERIVATIVE, FLUORINE-CONTAINING ADAMANTANE DERIVATIVE HAVING POLYMERIZABLE GROUP, RESIN COMPOSITION CONTAINING THE SAME, AND ANTIREFLECTION FILM
#100Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#101Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#102Polyfluoroalkyl alcohol, or (METH)acrylic acid derivative thereof, and process for producing the same
#103Method for producing fluorine-containing alkyl (meth)acrylate
#104Fluorine-containing compound, fluorine-containing polymer, negative-type resist composition, and patterning process using same
#105Fluorine-containing compound, fluorine-containing polymer, postive-type resist composition, and patterning process using same
#106SYNTHESIS OF FLUOROALCOHOL-SUBSTITUTED (METH)ACRYLATE ESTERS AND POLYMERS DERIVED THEREFROM
#107Photosensitive monomer, liquid crystal material having the same, liquid crystal panel and method for manufacturing thereof by incorporating the same, and electro-optical device and method for manufacturing thereof by incorporating the same
#108Fluorosurfactants
#109Hydrolytically resistant thermoset monomers
#110Fluoroadamantane derivative
#111Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers
#112HIGH REFRACTIVE INDEX MONOMERS FOR OPTICAL APPLICATIONS
#113Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#114Percursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#115Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#116Method For Producing Fluorine-Containing (Meth)Acrylic Ester
#117Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern
#118Modified chalcone compounds as antimitotic agents
#119Polymerizable fluorinated ester compounds and their preparing processes
#120Method for Producing Fluorine-Containing Acrylic Ester
#121Method for Producing Fluorine-Containing Acrylic Ester
#122Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
#123Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
#124Fluoroadamantane derivative
#125Process for preparing fluorinated alkyl carboxylate esters
#126Process for producing fluorine-containing diol and its derivatives
#127Fluorine-containing polymerisable monomer and polymer prepared by using same
#128Polymerizable acrylate compound containing hexafluorocarbinol group and polymer made therefrom
#129Flame retardant polymers having pendant groups related to bisphenol-C and monomers for synthesis thereof
#130High refractive index monomers for optical applications
#131Method for producing fluorine-containing acrylate
#1323-Hydroxypropyl ester of 2-trifluoromethylacrylic acid and process for producing same
#133Polymerizable fluorinated ester, manufacturing method, polymer, photoresist composition and patterning process
#134Monomers for photoresists bearing acid-labile groups of reduced optical density
#135FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION
#136Processes for producing fluorine-containing 2,4-diols and their derivatives
#137Process for producing acrylic ester compound
#138Process for producing α-substituted acrylic acid esters
#139Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same
#140Method for producing mixture of fluoroalkyl iodide telomers and method for producing mixture of fluorine-containing (meth)acrylate esters
#141Process for preparing acrylate compound
#142Aqueous suspensions of pentabromobenzyl acrylate
#143Polymerizable adamantane derivative, production process thereof and polymeric compound
#144Perfluoroadamantyl acrylate compound and intermediate therefor
#145Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
#146Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use
#147Process for producing fluoroalkyl iodide
#148Esterfication process for production of fluoroalkyl (meth)acrylate by pervaporation-aided membrane reactor
#149Aqueous suspensions of pentabromobenzyl acrylate
#150Methods of fire retarding textiles with aqueous suspensions of pentabromobenzyl acrylate
#151Process for producing a polyfluoroalkyl (meth) acrylate