95799 ⎘
Compounds containing elements of Groups 4 or 14 of the Periodic System; Tin compounds Compounds having one or more tin-oxygen linkages
Sub-classes:MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
#2SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#3SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#4SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#5ORGANOMETALLIC COMPOUND, RESIST COMPOSITION COMPRISING THE SAME, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION
#6TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION
#7POSITIVE-TONE ORGANOMETALLIC EUV RESISTS
#8METHODS TO PRODUCE ORGANOTIN COMPOSITIONS WITH CONVENIENT LIGAND PROVIDING REACTANTS
#9METHODS TO PRODUCE ORGANOTIN COMPOSITIONS WITH CONVENIENT LIGAND PROVIDING REACTANTS
#10RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME
#11PROCESS FOR REMOVING TIN OXIDE DEPOSITS
#12SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#13SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#14HIGH PURITY TIN COMPOUNDS AND RELATED COMPOSITIONS AND RELATED METHODS
#15ORGANOMETALLIC COMPOSITIONS WITH POLYENE LIGANDS, RADIATION SENSITIVE COATINGS WITH BRIDGING ORGANIC LIGANDS AND PATTERNING
#16SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#17SEMICONDUCTOR PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING THE COMPOSITION
#18HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND METHOD FOR PREPARATION THEREOF
#19HIGH PURITY TIN COMPOUNDS CONTAINING FLUOROALKOXY SUBSTITUENT AND METHODS FOR PREPARATION THEREOF
#20METHOD OF FORMING PATTERNS AND PHOTORESIST FILM
#21Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
#22SEMICONDUCTOR PHOTORESIST COMPOSITION, METHOD FOR PREPARING THEREOF AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#23TIN COMPOUND AND RESIST SOLUTION USING THE SAME, PATTERN FORMING METHOD, THIN FILM, PATTERNED THIN FILM, AND METHOD FOR PRODUCING TIN COMPOUND
#24TIN COMPOUNDS CONTAINING A TIN-OXYGEN DOUBLE BOND, A PHOTORESIST COMPOSITION CONTAINING THE SAME AND A METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME
#25ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION
#26PHOTORESIST COMPOSITIONS AND METHODS OF FORMING PATTERNS USING A PHOTORESIST COMPOSITION
#27Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
#28MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
#29ORGANOTIN COMPOSITIONS HAVING LIGANDS WITH ACETAL FUNCTIONAL GROUPS, PATTERNING COMPOSITIONS WITH ORGANOTIN BLENDS AND POSITIVE TONE PATTERNING
#30SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#31LITHOGRAPHY COMPOSITIONS AND METHODS FOR FORMING RESIST PATTERNS AND/OR MAKING SEMICONDUCTOR DEVICES
#32ORGANOTIN PHOTORESISTS AND METHOD OF DEVELOPING PHOTOLITHOGRAPHY PATTERN
#33ORGANOTIN CLUSTERS, SOLUTIONS OF ORGANOTIN CLUSTERS, AND APPLICATION TO HIGH RESOLUTION PATTERNING
#34STANNOUS ALKOXIDES AND RELATED METHODS
#35Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
#36ORGANOTIN PHOTORESIST COMPOSITION AND METHOD OF STABILIZATION
#37TIN DODECAMERS AND RADIATION PATTERNABLE COATINGS WITH STRONG EUV ABSORPTION
#38HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND METHOD FOR PREPARATION THEREOF
#39ORGANOTIN CLUSTER PHOTORESISTS AND STABILIZATION METHODS
#40SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#41Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, And Patterning Process
#42SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#43ORGANOMETALLIC COMPOUND, RESIST COMPOSITION INCLUDING THE SAME AND PATTERN FORMING METHOD USING THE SAME
#44PHOTORESIST COMPOSITION AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#45NOVEL ORGANOTIN SILICATE COMPOUNDS, PREPARATION METHODS THEREOF AND PHOTORESIST COMPOSITION CONTAINING THE SAME
#46DIRECT SYNTHESIS OF ORGANOTIN ALKOXIDES
#47MONOALKYL TIN COMPOUNDS WITH LOW POLYALKYL CONTAMINATION, THEIR COMPOSITIONS AND METHODS
#48SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#49SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERS USING THE COMPOSITION
#50HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND METHOD FOR PREPARATION THEREOF
#51SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#52Compound For Forming Metal-Containing Film, Composition For Forming Metal-Containing Film, Patterning Process, And Semiconductor Photoresist Material
#53IODOALKYL TIN COMPOUNDS AND PREPARATION METHODS THEREOF
#54COMPOSITIONS FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND RELATED METHODS
#55HIGH PURITY TIN COMPOUNDS CONTAINING UNSATURATED SUBSTITUENT AND METHOD FOR PREPARATION THEREOF
#56High purity tin compounds containing unsaturated substituent and method for preparation thereof
#57COMPOUNDS AND PROCESSES FOR EXTREME ULTRAVIOLET LITHOGRAPHY
#58MONO-TIN ORGANIC COMPOUND AND PREPARATION METHOD AND USE THEREOF
#59ORGANOMETALLIC COMPOUND COMPRISING A METAL COMBINED WITH AT LEAST ONE LIGAND CONTAINING FOUR OR MORE FLUORINE ATOMS, RESIST COMPOSITION COMPRISING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME
#60SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
#61Organometallic tin compounds as EUV photoresist
#62Organometallic tin compounds as EUV photoresist
#63PRODUCTION PROCESS FOR AMINO ALCOHOLATES
#64GPX4 COMPOUNDS AND COMPOSITIONS AND METHODS OF TREATMENT USING SAME
#65DEUTERATED ORGANOTIN COMPOUNDS, METHODS OF SYNTHESIS AND RADIATION PATTERNING
#66Organometallic cluster photoresists for EUV lithography
#67Tin dodecamers and radiation patternable coatings with strong EUV absorption
#68ORGANOMETALLIC COMPOUNDS FOR THE DEPOSITION OF HIGH PURITY TIN OXIDE AND DRY ETCHING OF THE TIN OXIDE FILMS AND DEPOSITION REACTORS
#69Reducing agents for atomic layer deposition
#70Semiconductor photoresist composition and method of forming patterns using the composition
#71Semiconductor photoresist composition, method for preparing thereof and method of forming patterns using the composition
#72METHODS TO PRODUCE ORGANOTIN COMPOSITIONS WITH CONVENIENT LIGAND PROVIDING REACTANTS
#73Raw material for forming thin film by atomic layer deposition method, method of producing thin film, and alkoxide compound
#74PHOTORESIST COMPOSITIONS
#75Semiconductor photoresist composition and method of forming patterns using the composition
#76Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
#77Semiconductor resist composition, and method of forming patterns using the composition
#78Semiconductor photoresist composition and method of forming patterns using the composition
#79Hydroximic acid-metal hydroxide coordination complex and preparation and application thereof
#80TRANSITION METAL ORGANIC FRAMEWORK HAVING ANTIBACTERIAL PROPERTIES
#81Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
#82Two-dimensional perovskite compositions and devices therefrom
#83Semiconductor photoresist composition, and method of forming patterns using the composition
#84Organometallic cluster photoresists for EUV lithography
#85Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
#86Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
#87Semiconductor photoresist composition and method of forming patterns using the composition
#88BIOSENSOR
#89Polycyclic aromatic compound
#90Semiconductor resist composition, and method of forming patterns using the composition
#91Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
#92Monoalkyl tin compounds with low polyalkyl contamination, their compositions and methods
#93Tin dodecamers and radiation patternable coatings with strong EUV absorption
#94Organotin clusters, solutions of organotin clusters, and application to high resolution patterning
#95Metal precursor for making metal oxide
#96Composition containing naphthalocyanine derivative, photoelectric conversion element containing the same, and imaging device
#97Paper coating material having environment-friendly, water-proof and oil-proof properties, and method of manufacturing the same
#98Polycyclic aromatic compound
#99Stannous methanesulfonate solution with adjusted pH
#100Alkyl tin compound
#101Metal-organic frameworks with exceptionally large pore aperatures
#102Tin dioxide nanopartcles and method for making the same
#103Metal-organic frameworks with exceptionally large pore aperatures
#104TIN OXIDE-CONTAINING POLYMER COMPOSITE MATERIALS
#105ORGANOTIN COMPOUNDS, PREPARATION METHOD THEREOF, AND PREPARATION OF POLYLACTIDE RESIN USING THE SAME
#106TIN(II)-2-HYDROXYCARBOXYLATES
#107High purity monoalkyltin compounds and uses thereof
#108Process for the production of sucrose-6-ester
#109Low temperature, single solvent process for the production of sucrose-6-ester
#110Process for producing alkyl tin alkoxide compound and process for producing carbonic acid ester using said compound
#111METHOD FOR PRODUCING MACROLIDE COMPOUND AND PRODUCTION INTERMEDIATE THEREOF
#112Process for producing dialkyl tin dialkoxides
#113Process for production of alkyltin alkoxides
#114Organo-metal compounds