97825 ⎘
Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms; Halogens Chlorine
CROSSLINKABLE POLYMERIC MATERIALS FOR DIELECTRIC LAYERS IN ELECTRONIC DEVICES
#2Ionic liquid based support for manufacture of peptides
#3Hybrid supported metallocene catalyst and polyolefin preparation method using same
#4Polymeric acid catalysts and uses thereof
#5Crosslinkable polymeric materials for dielectric layers in electronic devices
#6Polymer compound, method for preparing modified and conjugated diene-based polymer using the same, and modified and conjugated diene-based polymer
#7Cyclopropenium polymers and methods for making the same
#8Iminodiacetate chelating resin and manufacturing method therefor
#9Fluoropolymers and membranes comprising fluoropolymers (I)
#10Poly(ethylene glycol)-b-poly(halomethylstyrene), derivative thereof, and method for producing same
#11Compound for organic light-emitting device, cross-linked material thereof, and organic light-emitting device including cross-linked material
#12Ion exchange membrane, method for manufacturing same, module, and device
#13Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
#14Composition containing polycationic triblock copolymer, polyanionic polymer and physiologically active peptide
#15Polymeric acid catalysts and uses thereof
#16Anion exchange membranes and process for making
#17Triblock copolymer and use therefor
#18Anion exchange membranes and process for making
#19Polymeric acid catalysts and uses thereof
#20Resist pattern forming method, resist pattern, crosslinkable negative resist composition, nanoimprint mold and photomask
#21Polymeric acid catalysts and uses thereof
#22Chemoselective enrichment for compound isolation
#23Chemical amplification resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
#24Polymeric acid catalysts and uses thereof
#25PHOTO-CROSSLINKABLE MATERIAL FOR ORGANIC THIN FILM TRANSISTOR INSULATING LAYER
#26Polymeric acid catalysts and uses thereof
#27MONODISPERSE CHLOROMETHYLSTYRENE POLYMER AND PRODUCING METHOD THEREOF
#28GI type optical fiber and method for manufacturing same
#29HYPERBRANCHED POLYMER SYNTHESIZING METHOD, HYPERBRANCHED POLYMER, RESIST COMPOSITION, SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT FABRICATION METHOD
#30Brominated styrenic polymers and their preparation
#31Multi-branched polymer
#32Brominated styrenic polymers and their preparation