ClassID:

97884

C08F20/02 - CPC Classification

Classification description:

Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof

Sub-classes:
Recent Application in this class:
#1
20200089116
2020-03-19

Fluorine-containing monomer, fluorine-containing polymer, pattern forming composition using same, and pattern forming method of same

#2
20190177450
2019-06-13

FUNCTIONALIZED BIMODAL IMPACT MODIFIERS

#3
20190023842
2019-01-24

Resist material and pattern forming method using same

#4
20170331114
2017-11-16

Polymer compound, intermediate composition, negative electrode, electricity storage device, slurry for negative electrodes, method for producing polymer compound, and method for producing negative electrode

#5
20170107310
2017-04-20

Polyelectrolytic polymers, process for their preparation and uses thereof

#6
20160052844
2016-02-25

Digestion of keratin

#7
20160023992
2016-01-28

Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer

#8
20150307433
2015-10-29

Process for the production of (meth)acrylic acid and derivatives and polymers produced therefrom

#9
20150028524
2015-01-29

RESIST MATERIAL AND PATTERN FORMING METHOD USING SAME

#10
20140296440
2014-10-02

Ionic silicone hydrogels having improved hydrolytic stability

#11
20140031501
2014-01-30

Process for the production of (meth)acrylic acid and derivatives and polyers produced therefrom

#12
20130197177
2013-08-01

Cationic thickeners, free of oil and surfactants, method for preparing same and composition containing same

#13
20130172115
2013-07-04

Golf ball resin composition and golf ball

#14
20120271020
2012-10-25

Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer

#15
20120245317
2012-09-27

Photochromic material

#16
20110160338
2011-06-30

FUNCTIONALIZED BIMODAL IMPACT MODIFIERS

#17
20110015296
2011-01-20

Superabsorbent polymer composite particles and processes therefore

#18
20100256308
2010-10-07

PROCESS FOR THE PRODUCTION OF WATER-ABSORBING RESINS AND WATER-ABSORBING RESINS OBTAINED BY THE PROCESS

#19
20100249356
2010-09-30

Ionic silicone hydrogels having improved hydrolytic stability

#20
20100160585
2010-06-24

Method and apparatus for isolating and purifying nucleic acid using a single surface

#21
20080182934
2008-07-31

Acid-functionalized hydrophobic monomer emulsions, latexes, and associated latexes

#22
20080153946
2008-06-26

Curable aqueous compositions

#23
20080118972
2008-05-22

Method and apparatus for isolating and purifying nucleic acid using a single surface