98193 ⎘
Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an alcohol radical Carbocyclic compounds
POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS
#2PREPARATION OF TERTIARY ESTER-CONTAINING AROMATIC VINYL MONOMER
#3RADIOPAQUE POLYMERS
#4PHOTOSENSITIVE POLYMER CAPABLE OF MULTI-STEP DEPROTECTION REACTION, PHOTORESIST COMPOSITION INCLUDING THE PHOTOSENSITIVE POLYMER, AND METHOD OF MANUFACTURING THE INTEGRATED CIRCUIT DEVICE
#5Polymer material and method for producing same
#6Radiopaque polymers
#7Surfactant composition
#8Cyclopentene monomers and methods of polymerization
#9Polymer, resist composition, and pattern forming process
#10Compound, polymer compound, resist composition, and patterning process
#11Polymer compound, positive resist composition, laminate, and resist patterning process
#12Resist composition
#13Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compound
#14Polymer, monomer, resist composition, and patterning process
#15Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device
#16Resin, resist composition and method for producing resist pattern
#17Polymers for hard masks, hard mask compositions including the same, and methods for forming a pattern of a semiconductor device using a hard mask composition
#18POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
#19Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process
#20POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
#21CNSL-based hydrocarbon resins, preparation and uses thereof
#22Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#23Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#24ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION, RESIST FILM USING THE SAME, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
#25Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device
#26Positive resist composition and patterning process
#27Positive resist composition and patterning process
#28ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
#29Polymerizable spirobisindane monomers and polymers prepared therefrom
#30Negative resist composition and pattern forming process
#31CNSL-based hydrocarbon resins, preparation and uses thereof
#32ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
#33Compound, resin, photoresist composition, and method for producing photoresist pattern
#34Resist top coat composition and patterning process
#35Photocurable polymeric dielectrics and methods of preparation and use thereof
#36Resist-protective film-forming composition and patterning process
#37Immersion upper layer film forming composition and method of forming photoresist pattern
#38Photocurable polymeric dielectrics containing 6-substituted coumarin moieties and methods of preparation and use thereof
#39Acidic superabsorbent hydrogels
#40Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
#41Method of producing water-soluble nonturbid copolymers of at least one water-soluble N-vinyllactam and at least one hydrophobic comonomer
#42Method of producing water-soluble nonturbid copolymers of at least one water-soluble N-vinyllactam and at least one hydrophobic comonomer
#43Method of producing water-soluble nonturbid copolymers of at least one water-soluble N-vinyllactam and at least one hydrophobic comonomer
#44Method of producing water-soluble nonturbid copolymers of at least one water-soluble n-vinyllactam and at least one hydrophobic comonomer
#45Acidic superabsorbent hydrogels
#46Acidic superabsorbent hydrogels