C08F216/165 - CPC Classification Index

ClassID:

98209 ⎘

C08F216/165 - CPC Classification

Classification description:

Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical; Monomers containing only one unsaturated aliphatic radical; Monomers containing no hetero atoms other than the ether oxygen Carbocyclic compounds

Recent Application in this class:

20190185603

2019-06-20

Cyclopentene monomers and methods of polymerization

20190106540

2019-04-11

MONOMER COMPOSITION AND CURABLE COMPOSITION CONTAINING SAME

20180201561

2018-07-19

Alkenylphenoxy-substituted 1,1-diphenylethylenes, processes for their preparation, and their use

20170342178

2017-11-30

Polyphenylene oxide prepolymer, method of making the same, resin composition and product made therefrom

20170336728

2017-11-23

ULTRAVIOLET CURABLE LIQUID COMPOSITION, ULTRAVIOLET CURING INKJET INK, ULTRAVIOLET CURING WET ELECTROPHOTOGRAPHIC LIQUID DEVELOPER, ULTRAVIOLET CURING ELECTROSTATIC INKJET INK, AND IMAGE FORMING METHOD USING THEREOF

20170115570

2017-04-27

Resin composition, resist pattern-forming method and polymer

20170038683

2017-02-09

Compound, polymer compound, resist composition, and patterning process

20170029547

2017-02-02

Resist composition and patterning process using the same

20160229940

2016-08-11

POLYMER, RESIST COMPOSITION, AND PATTERN FORMING PROCESS

#10

20160185999

2016-06-30

RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD AND POLYMER

#11

20150253662

2015-09-10

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE

#12