ClassID:

98278

C08F220/52 - CPC Classification

Classification description:

Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof; Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof Amides or imides

Sub-classes:
Recent Application in this class:
#1
20200309782
2020-10-01

Intracellular delivery vehicle

#2
20200278610
2020-09-03

Transfer film, electrode protective film, laminate, capacitive input device, and manufacturing method of touch panel

#3
20190322864
2019-10-24

Vesicular system and uses thereof

#4
20180355085
2018-12-13

Styrene-acrylonitrile resin with high thermal resistance and method for producing the same

#5
20170277037
2017-09-28

Resist composition and pattern forming process

#6
20150238521
2015-08-27

Nanoparticle compositions of antibacterial compounds and other uses thereof

#7
20140092473
2014-04-03

Acrylic resin composition, and optical film comprising same

#8
20130344439
2013-12-26

Photoresists comprising amide component

#9
20130058910
2013-03-07

DECONTAMINATION OF CHEMICAL AND BIOLOGICAL AGENTS

#10
20110297896
2011-12-08

Acrylic resin composition, and optical film comprising same

#11
20100221971
2010-09-02

WATER-REPELLENT/OIL-REPELLENT AGENT TO BE ADDED TO THERMOPLASTIC RESIN

#12
20100204424
2010-08-12

Non-specific adsorption inhibitor

#13
20100187111
2010-07-29

Graft copolymers, their preparation and use in capillary electrophoresis

#14
20070191564
2007-08-16

Ring-opened azlactone telechelic polymer

#15
20060074211
2006-04-06

Ring-opened azlactone telechelic polymer

#16
20050288410
2005-12-29

Copolymer functionalized with an iodine atom, composition comprising it and treatment process

#17
20050234166
2005-10-20

Graft copolymers, their preparation and use in capillary electrophoresis

#18
14534824
2016-01-26

Non-ionic photo-acid generating polymers for resist applications