Patents-Review.com
ClassID:

98316 ⎘

C08F222/18 - CPC Classification

Classification description:

Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof; Esters of phenols or saturated alcohols Esters containing halogen

Sub-classes:
Recent Application in this class:
#1
20260008878
2026-01-08

METHOD FOR THE PREPARATION OF PHOTOALIGNING POLYMER MATERIALS AND COMPOSITIONS

 #2
20230058958
2023-02-23

ARTICLE AND METHOD OF MAKING ARTICLE

 #3
20220332869
2022-10-20

AMPHIPHILIC COPOLYMER WITH ZWITTERIONIC AND FLUORINATED MOIETIES

 #4
20200409262
2020-12-31

Resist composition and method of forming resist pattern

 #5
20200377736
2020-12-03

OPTICALLY CLEAR PHOTO-POLYMERIZATION RESISTS FOR ADDITIVE MANUFACTURING OF RADIOPAQUE PARTS

 #6
20200148802
2020-05-14

METHOD FOR THE PREPARATION OF PHOTOALIGNING POLYMER MATERIALS AND COMPOSITIONS

 #7
20200061252
2020-02-27

Radiopaque polymers for medical devices

 #8
20190185605
2019-06-20

Method for preparing core-shell copolymer, core-shell copolymer and resin composition including the same

 #9
20190163057
2019-05-30

Resist composition, method of forming resist pattern, polymeric compound, and compound

 #10
20190112405
2019-04-18

Resin precursor composition for optical materials, optical element obtained from the composition, and diffractive optical element configured using the optical element

 #11
20190100646
2019-04-04

Resin composition and semiconductor device

 #12
20180284606
2018-10-04

Resist composition, method of forming resist pattern, fluorine-containing compound, and compound

 #13
20180275512
2018-09-27

Resist composition and patterning process

 #14
20180267403
2018-09-20

Resist composition and patterning process

 #15
20180267402
2018-09-20

Resist composition and patterning process

 #16
20180251648
2018-09-06

Oligomeric aminoketones and their use as photoinitiators

 #17
20180231690
2018-08-16

Anti-reflective film and preparation method of the same

 #18
20180215850
2018-08-02

Photocurable resin composition and method of forming patterns using the same

 #19
20180155472
2018-06-07

Optically clear photo-polymerization resists for additive manufacturing of radiopaque parts

 #20
20180126045
2018-05-10

Radiopaque polymers for medical devices

 #21
20170275813
2017-09-28

Water/oil repellent composition, method for its production, and article

 #22
20170190813
2017-07-06

Methods of treatment to improve the quality of alcoholic beverages using vinyl lactam-derived polymer-hydrogen peroxide complexes

 #23
20170183438
2017-06-29

RESIN PRECURSOR COMPOSITION FOR OPTICAL MATERIALS, OPTICAL ELEMENT OBTAINED FROM THE COMPOSITION, AND DIFFRACTIVE OPTICAL ELEMENT CONFIGURED USING THE OPTICAL ELEMENT

 #24
20160377979
2016-12-29

Resist composition

 #25
20160355675
2016-12-08

Triboelectrically neutral polymer

 #26
20160244400
2016-08-25

Compound, resin and photoresist composition

 #27
20160160061
2016-06-09

Oligomeric aminoketones and their use as photoinitiators

 #28
20160145186
2016-05-26

Non-ionic compound, resin, resist composition and method for producing resist pattern

 #29
20160077432
2016-03-17

Resin, resist composition and method for producing resist pattern

 #30
20160077431
2016-03-17

Resin, resist composition and method for producing resist pattern

 #31
20160077430
2016-03-17

Resin, resist composition and method for producing resist pattern

 #32
20160077429
2016-03-17

Resin, resist composition and method for producing resist pattern

 #33
20150374884
2015-12-31

Radiopaque polymers for medical devices

 #34
20150198879
2015-07-16

Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same

 #35
20150030982
2015-01-29

Fluorinated photopolymer with fluorinated sensitizer

 #36
20150030981
2015-01-29

Cross-linkable fluorinated photopolymer

 #37
20140287359
2014-09-25

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

 #38
20140243451
2014-08-28

Rubbery polymer with low compression set

 #39
20140114080
2014-04-24

Fluorinated monomer, polymer, resist composition, and patterning process

 #40
20140051024
2014-02-20

Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid

 #41
20130302623
2013-11-14

Coating composition for low refractive layer including fluorine-containing compound, anti-reflection film using the same, polarizer and image display device including the same

 #42
20130123382
2013-05-16

Curable composition and process for producing cured film

 #43
20130065182
2013-03-14

Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method

 #44
20120164581
2012-06-28

Negative resist composition, method of forming resist pattern and polymeric compound

 #45
20120083580
2012-04-05

Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid

 #46
20110151381
2011-06-23

Fluorinated monomer, fluorinated polymer, resist composition, and patterning process

 #47
20090012250
2009-01-08

NOVEL POLYMERIZABLE SURFACE ACTIVE MONOMERS WITH BOTH FLUORINE-CONTAINING GROUPS AND HYDROPHILIC GROUPS

 #48
20060229379
2006-10-12

Photosensitive acrylate composition and waveguide device

 #49
20060167213
2006-07-27

Process of preparing crosslinked, low loss polymers with tunable refractive indices

 #50
20060167212
2006-07-27

Crosslinked polymers with low loss and tunable refractive indices

 #51
20050234206
2005-10-20

Fluoropolymer and resist composition