ClassID:

98650

C08G10/02 - CPC Classification

Classification description:

Condensation polymers of aldehydes or ketones with aromatic hydrocarbons or halogenated aromatic hydrocarbons only of aldehydes

Sub-classes:
Recent Application in this class:
#1
20250376554
2025-12-11

HIGHLY ALKALI-STABLE POLY(ARYLENE ALKYLENE PIPERIDINIUM) CATIONIC POLYMER HAVING BRANCHED STRUCTURE, AND PREPARATION METHOD AND USE THEREOF

#2
20250376553
2025-12-11

HIGHLY ALKALI-STABLE POLY(ARYLENE ALKYLENE PIPERIDINIUM) CATIONIC POLYMERS AND PREPARATION METHODS AND APPLICATIONS

#3
20240319602
2024-09-26

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

#4
20230259031
2023-08-17

RESIST UNDERLAYER FILM-FORMING COMPOSITION

#5
20180074406
2018-03-15

Compound, resist composition, and method for forming resist pattern using it

#6
20180074402
2018-03-15

Resist composition, method for forming resist pattern, and polyphenol compound used therein

#7
20170145142
2017-05-25

Resist material, resist composition and method for forming resist pattern

#8
20170144954
2017-05-25

Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method

#9
20150065756
2015-03-05

Liquid resol-type phenolic resin and wet paper friction material

#10
20150018499
2015-01-15

Naphthalene formaldehyde resin, deacetalized naphthalene formaldehyde resin, and modified naphthalene formaldehyde resin

#11
20120268840
2012-10-25

Carbon nano-tube dispersant

#12
20120184103
2012-07-19

Resist underlayer film composition and patterning process using the same

#13
20120171611
2012-07-05

Aromatic hydrocarbon resin and composition for forming underlayer film for lithography

#14
20110098387
2011-04-28

Dispersant for hydraulic composition

#15
20100324255
2010-12-23

Polyfunctional dimethylnaphthalene formaldehyde resin, and process for production thereof

#16
20100316950
2010-12-16

Composition for forming base film for lithography and method for forming multilayer resist pattern

#17
20100209810
2010-08-19

POLYMER ELECTROLYTE COMPOSITION

#18
20100119980
2010-05-13

Antireflective Coating Composition Comprising Fused Aromatic Rings

#19
20080160460
2008-07-03

Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer