ClassID:

98636

C08G8/14 - CPC Classification

Classification description:

Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed with halogenated phenols

Recent Application in this class:
#1
20260028443
2026-01-29

POLYMER MEDICAMENT FOR TREATING HYPERKALEMIA AND PREPARATION METHOD THEREOF

#2
20230102317
2023-03-30

POLYMER MEDICAMENT FOR TREATING HYPERKALEMIA AND PREPARATION METHOD THEREOF

#3
20200409261
2020-12-31

Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method

#4
20190077901
2019-03-14

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

#5
20190041750
2019-02-07

Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, pattern forming method, resin, and purification method

#6
20180095368
2018-04-05

Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method

#7
20180074406
2018-03-15

Compound, resist composition, and method for forming resist pattern using it

#8
20180074402
2018-03-15

Resist composition, method for forming resist pattern, and polyphenol compound used therein

#9
20170145142
2017-05-25

Resist material, resist composition and method for forming resist pattern

#10
20170144954
2017-05-25

Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method

#11
20150362835
2015-12-17

Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same

#12
20150337077
2015-11-26

Novolak resin containing hexafluoroisopropanol group, method for producing same, and composition of same

#13
20090137355
2009-05-28

Coating liquid for coating glass fiber and rubber-reinforcing glass fiber using the same