107999 ⎘
Other compounding ingredients of detergent compositions covered in group; Organic compounds containing halogen containing fluorine
Clog Release Compositions and Methods
#2Windshield Cleaning Composition And Method Of Use
#3CLEANING AGENT COMPOSITION AND CLEANING METHOD
#4TERTIARY AZEOTROPE AND AZEOTROPE-LIKE COMPOSITIONS FOR SOLVENT AND CLEANING APPLICATIONS
#5AQUEOUS CLEANING LIQUID
#6AQUEOUS CLEANING LIQUID
#7CLEANING AGENT COMPOSITION AND CLEANING METHOD
#8COMPOSITION FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE
#9Composition for removing polymer
#10COMPOSITION COMPRISING MONOCHLOROTRIFLUOROPROPENE AND STABILIZER, AND ITS APPLICATIONS
#11POST CMP CLEANING COMPOSITION
#12Composition, Aerosol Composition, Cleaning Agent, Solvent, Silicone Solvent, Foaming Agent, Heat-Transfer Medium, Fire Extinguishing Agent, and Fumigant Containing the Composition, Heat-Transfer Device Containing the Heat-Transfer Medium, and System Containing the Heat-Transfer Device
#13Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product
#14MXene with excellent mechanical strength and fast and high-yield anhydrous synthesis method thereof
#15AEROSOL CLEANING COMPOSITION
#16COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER
#17Cleaning agent composition comprising an alkylamide solvent and a fluorine-containing quaternary ammonium salt
#18Hydrofluorothioethers and methods of using same
#19PROCESS SOLUTION COMPOSITION FOR POLYMER TREATMENT
#20PROCESS LIQUID COMPOSITION FOR LITHOGRAPHY AND PATTERN FORMING METHOD USING SAME
#21PROCESS SOLUTION FOR POLYMER PROCESSING
#22CLEANING AGENT COMPOSITION AND CLEANING METHOD
#23Cleaning agent composition and cleaning method
#24Hydrofluoroolefins and methods of using same
#25Method and compositions for cleaning aluminum cans
#26Cleaning solution composition and cleaning method using the same
#27Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process
#28Composition for removing polymer
#29Process for producing 1,1,3-trichloro-4,4,4-trifluorobut-1-ene
#30Aerosol cleaning composition
#31Hydrofluoroolefin ethers, compositions, apparatuses and methods for using same
#32AZEOTROPIC COMPOSITIONS COMPRISING HYDROGEN FLUORIDE AND FLUOROCARBONS
#33Method and compositions for cleaning aluminum cans
#34COMPOSITIONS CONTAINING FLUORINE SUBSTITUTED OLEFINS AND METHODS AND SYSTEMS USING SAME
#35Nitrogen and/or oxygen-containing hydrofluoroolefins and methods of making and using the same
#36COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
#37Methods of treating fabrics and related compositions
#38Detergent in the form of a laundry storage envelope having enhanced resistance to water
#39Azeotropic compositions comprising hydrogen fluoride and fluorocarbons
#40Amine-containing acyclic hydrofluoroethers and methods of using the same
#41Aerosol cleaning composition
#42Composition for removing silicone resins and method of thinning substrate by using the same
#43SILICONE SURFACTANT, AND SILICONE-DISSOLVATIVE CLEANER CONTAINING THE SAME
#44Hard surface cleaners including fluorosurfactants
#45AZEOTROPIC AND AZEOTROPE-LIKE COMPOSITIONS OF Z-1-CHLORO-3,3,3-TRIFLUOROPROPENE
#46COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE AND CYCLOPENTANE
#47Cleaning composition for semiconductor substrate and cleaning method
#48COMPOSITIONS CONTAINING FLUORINE SUBSTITUTED OLEFINS AND METHODS AND SYSTEMS USING SAME
#49Aqueous and semi-aqueous cleaners for the removal of post-etch residues with tungsten and cobalt compatibility
#50Cleaning solution, set of ink and cleaning solution, cleaning solution stored container, inkjet printing apparatus, and inkjet printing method
#51Low flammability solvent composition
#52Cleaning compositions and methods
#53Cleaning composition with propellant
#54COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
#55CLEANING COMPOSITION, COATINGS PREPARED THEREFROM AND METHOD OF CLEANING
#56Ternary compositions of methyl perfluoroheptene ethers and trans-1,2-dichloroethylene, and uses thereof
#57Printing press cleaning compositions
#58Pre-fill wafer cleaning formulation
#59Compositions of methyl perfluoroheptene ethers, 1,1,1,2,2,3,4,5,5,5-decafluoropentane and trans-1,2-dichloroethylene and uses thereof
#60Cleaning compositions and methods
#61Wafer cleaning formulation
#62Silicone solvent
#63Compositions comprising a fluorosurfactant and a hydrotrope
#64PRINTING PRESS CLEANING COMPOSITIONS
#65Copper cleaning and protection formulations
#66Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
#67Methods for making 3-chloro-1,1,1,6,6,6-hexafluoro-2,4-hexadiene
#68Stabilized Liquid Enzyme Composition
#69Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
#70Solvent compositions comprising unsaturated fluorinated hydrocarbons
#71FORMULA FOR REMOVING COLOR COATS AND VARIOUS SOIL LAYERS FROM SURFACES, METHOD FOR PRODUCING THE AGENT, AND METHOD FOR CLEANING
#723-chloro 1,1,1,6,6,6-hexafluoro-2,4-hexadiene and solvent compositions containing the same
#73Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition
#74Post deposition wafer cleaning formulation
#75COMPOSITIONS AND USES OF CIS-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE
#76Composition and method for cleaning semiconductor substrates comprising an alkyl diphosphonic acid
#77CLEANING SYSTEM UTILIZING AN ORGANIC CLEANING SOLVENT AND A PRESSURIZED FLUID SOLVENT
#78Solvent Compositions Comprising Unsaturated Fluorinated Hydrocarbons
#79Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
#80Propanediol soil resist compositions
#81Solvent compositions comprising unsaturated fluorinated hydrocarbons
#82LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
#83Solvent compositions comprising unsaturated fluorinated hydrocarbons
#84Fluorosurfactants
#85Compositions containing fluorine substituted olefins
#86Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
#87PRINTING PRESS CLEANING
#88Formulations for cleaning ion-implanted photoresist layers from microelectronic devices
#89SEMICONDUCTOR ETCH RESIDUE REMOVER AND CLEANSING COMPOSITIONS
#90Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
#91Two step cleaning process to remove resist, etch residue, and copper oxide from substrates having copper and low-K dielectric material
#92Rinsing fluid for lithography
#93Resist, barc and gap fill material stripping chemical and method
#94Cleaning formulation for removing residues on surfaces
#95Compositions containing fluorine substituted olefins and methods and systems using same
#96Stabilized subtilisin composition
#97Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams and foam stabilizers
#98pH buffered aqueous cleaning composition and method for removing photoresist residue
#99Production processes and systems, compositions, surfactants, monomer units, metal complexes, phosphate esters, glycols, aqueous film forming foams, and foams stabilizers
#100Supercritical fluid-based cleaning compositions and methods
#101Solvent compositions comprising unsaturated fluorinated hydrocarbons
#102Solvent compositions comprising unsaturated fluorinated hydrocarbons
#103Blowing agents for forming foam comprising unsaturated fluorocarbons
#104Methods for making foams using blowing agents comprising unsaturated fluorocarbons
#105Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
#106Aqueous cleaning composition for removing residues and method using same
#107Selective removal chemistries for semiconductor applications, methods of production and uses thereof
#108Polymer remover
#109Cleaning and rinsing method
#110Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
#111Microelectronic cleaning compositions containing oxidizers and organic solvents
#112Method for cleaning chamber of deposition apparatus for organic EL device production